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Large area deep subwavelength interference lithography with a 35 nm half-period based on bulk plasmon polaritons 期刊论文
OPTICAL MATERIALS EXPRESS, 2018, 卷号: 8, 期号: 2, 页码: 199-209
Authors:  Liu, Hongchao;  Luo, Yunfei;  Kong, Weijie;  Liu, Kaipeng;  Du, Wenjuan;  Zhao, Chengwei;  Gao, Ping;  Zhao, Zeyu;  Wang, Changtao;  Pu, Mingbo;  Luo, Xiangang
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Proximity correction and resolution enhancement of plasmonic lens lithography far beyond the near field diffraction limit 期刊论文
RSC Advances, 2017, 卷号: 7, 期号: 20, 页码: 12366-12373
Authors:  Luo, Yunfei;  Liu, Ling;  Zhang, Wei;  Kong, Weijie;  Zhao, Chengwei;  Gao, Ping;  Zhao, Zeyu;  Pu, Mingbo;  Wang, Changtao;  Luo, Xiangang
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Plasmons - Scanning probe microscopy  
Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons 期刊论文
Optics Express, 2017, 卷号: 25, 期号: 17, 页码: 20511-20521
Authors:  Liu, Hongchao;  Kong, Weijie;  Liu, Kaipeng;  Zhao, Chengwei;  Du, Wenjuan;  Wang, Changtao;  Liu, Ling;  Gao, Ping;  Pu, Mingbo;  Luo, Xiangang
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HIGH-ASPECT-RATIO  PHOTONIC CRYSTALS  EUV LITHOGRAPHY  FABRICATION  DIFFRACTION  NANOLITHOGRAPHY  EXTREME  
Subdiffraction plasmonic lens lithography prototype in stepper mode 期刊论文
Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 2017, 卷号: 35, 期号: 1, 页码: 011603
Authors:  Liu, Minggang;  Zhao, Chengwei;  Luo, Yunfei;  Zhao, Zeyu;  Wang, Yanqin;  Gao, Ping;  Wang, Changtao;  Luo, Xiangang
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Lenses - Lithography - Metal working - Photolithography - Photoresists  
Modeling and experimental study of plasmonic lens imaging with resolution enhanced methods 期刊论文
Optics Express, 2016, 卷号: 24, 期号: 24, 页码: 27115-27126
Authors:  Zhao, Zeyu;  Luo, Yunfei;  Yao, Na;  Zhang, Wei;  Wang, Changtao;  Gao, Ping;  Zhao, Chengwei;  Pu, Mingbo;  Luo, Xiangang
Adobe PDF(3777Kb)  |  Favorite  |  View/Download:75/0  |  Submit date:2018/06/14
Electric Fields  Masks  Nanolithography  Numerical Methods  Optical Transfer Function  Plasmons  Surface Plasmon Resonance  
Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination 期刊论文
SCIENTIFIC REPORTS, 2015, 卷号: 5
Authors:  Zhao, Zeyu;  Luo, Yunfei;  Zhang, Wei;  Wang, Changtao;  Gao, Ping;  Wang, Yanqin;  Pu, Mingbo;  Yao, Na;  Zhao, Chengwei;  Luo, Xiangang
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Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination 期刊论文
SCIENTIFIC REPORTS, 2015, 卷号: 5, 页码: 15320
Authors:  Zhao, Zeyu;  Luo, Yunfei;  Zhang, Wei;  Wang, Changtao;  Gao, Ping;  Wang, Yanqin;  Pu, Mingbo;  Yao, Na;  Zhao, Chengwei;  Luo, Xiangang
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Enhancing aspect profile of half-pitch 32 nm and 22 nm lithography with plasmonic cavity lens 期刊论文
APPLIED PHYSICS LETTERS, 2015, 卷号: 106, 期号: 9, 页码: 93110
Authors:  Gao, Ping;  Yao, Na;  Wang, Changtao;  Zhao, Zeyu;  Luo, Yunfei;  Wang, Yanqin;  Gao, Guohan;  Liu, Kaipeng;  Zhao, Chengwei;  Luo, Xiangang;  Gao, P (reprint author), Chinese Acad Sci, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China.
Adobe PDF(2153Kb)  |  Favorite  |  View/Download:103/0  |  Submit date:2016/11/22