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Experimental analysis of solid immersion interference lithography based on backside exposure technique 期刊论文
MICROELECTRONIC ENGINEERING, 2011, 卷号: 88, 期号: 8, 页码: 2509-2512
Authors:  Li, Xupeng;  Shi, Sha;  Zhang, Zhiyou;  Wang, Jingquan;  Li, Shuhong;  Gao, Fuhua;  Shi, Ruiying;  Du, Jinglei;  Du, Chunlei;  Zhang, Yixiao
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Solid Immersion  Interference Lithography  Backside Exposure Technique