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Experimental analysis of solid immersion interference lithography based on backside exposure technique 期刊论文
MICROELECTRONIC ENGINEERING, 2011, 卷号: 88, 期号: 8, 页码: 2509-2512
Authors:  Li, Xupeng;  Shi, Sha;  Zhang, Zhiyou;  Wang, Jingquan;  Li, Shuhong;  Gao, Fuhua;  Shi, Ruiying;  Du, Jinglei;  Du, Chunlei;  Zhang, Yixiao
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Solid Immersion  Interference Lithography  Backside Exposure Technique  
A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique 期刊论文
OPTICS EXPRESS, 2010, 卷号: 18, 期号: 15, 页码: 15975-15980
Authors:  He, Mingyang;  Zhang, Zhiyou;  Shi, Sha;  Du, Jinglei;  Li, Xupeng;  Li, Shuhong;  Ma, Wenying
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A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique 期刊论文
Optics Express, 2010, 卷号: 18, 期号: 15, 页码: 15975-15980
Authors:  Mingyang He;  Zhiyou Zhang;  Sha Shi;  Jinglei Du;  Xupeng Li;  Shuhong Li;  Wenying Ma
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