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纳米光刻中叠栅莫尔条纹检焦技术研究 学位论文
, 北京: 中国科学院研究生院, 2015
Authors:  邸成良
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光刻  检焦  莫尔条纹  相位分析  
Moire-Based Absolute Interferometry With Large Measurement Range in Wafer-Mask Alignment 期刊论文
IEEE PHOTONICS TECHNOLOGY LETTERS, 2015, 卷号: 27, 期号: 4
Authors:  Di, Chengliang;  Yan, Wei;  Hu, Song;  Yin, Didi;  Ma, Chifei
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Moire Fringes  Measurement Range  Wafer-mask Alignment  Lithography  
Moiré-based absolute interferometry with large measurement range in wafer-mask alignment 期刊论文
IEEE Photonics Technology Letters, 2015, 卷号: 27, 期号: 4, 页码: 435-438
Authors:  Di, Chengliang;  Yan, Wei;  Hu, Song;  Yin, Didi;  Ma, Chifei
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基于线阵CCD的高速光刻检焦技术 期刊论文
红外与激光工程, 2015, 卷号: 44, 期号: 8, 页码: 2389-2394
Authors:  陈昌龙;  邸成良;  唐小萍;  胡松
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光刻  检焦  Fpga  线阵ccd  
Moiré-based absolute interferometry with large measurement range in wafer-mask alignment 期刊论文
IEEE Photonics Technology Letters, 2015, 卷号: 27, 期号: 4, 页码: 435-438
Authors:  Di, Chengliang;  Yan, Wei;  Hu, Song;  Yin, Didi;  Ma, Chifei
Adobe PDF(882Kb)  |  Favorite  |  View/Download:72/0  |  Submit date:2016/11/22
Dual-frequency-moiré based absolute position sensing for lens focusing 会议论文
, 2015
Authors:  Yin, Didi;  Wang, Yahui;  Di, Chengliang
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A Moire-Based Four-Channel Focusing and Leveling Scheme for Projection Lithography 期刊论文
IEEE PHOTONICS JOURNAL, 2014, 卷号: 6, 期号: 4
Authors:  Di, Chengliang;  Yan, Wei;  Hu, Song;  Li, Yanli;  Yin, Didi;  Tang, Yan;  Tong, Junmin
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Moire Fringes  Focusing And Leveling  Fringe Analysis  Lithography  
Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography 期刊论文
IEEE PHOTONICS JOURNAL, 2014, 卷号: 6, 期号: 3
Authors:  Di, Chengliang;  Hu, Song;  Yan, Wei;  Li, Yanli;  Li, Guang;  Tong, Junmin
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Interferometry  Metrology  Fringe Analysis  Phase Unwrapping  Lithography  
A modified alignment method based on four-quadrant-grating moiré for proximity lithography 期刊论文
Optik, 2014, 卷号: 125, 期号: 17, 页码: 4868-4872
Authors:  Di, Chengliang;  Zhu, Jiangping;  Yan, Wei;  Hu, Song;  Zhu, J. (chengliangdi@163.com)
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A moiré-based four-channel focusing and leveling scheme for projection lithography 期刊论文
IEEE Photonics Journal, 2014, 卷号: 6, 期号: 4, 页码: 6842663
Authors:  Di, Chengliang;  Yan, Wei;  Hu, Song;  Li, Yanli;  Yin, Didi;  Tang, Yan;  Tong, Junmin;  Di, C. (chengliangdi@163.com)
Adobe PDF(1153Kb)  |  Favorite  |  View/Download:46/0  |  Submit date:2016/11/23