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2011 [1]
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Experimental analysis of solid immersion interference lithography based on backside exposure technique
期刊论文
MICROELECTRONIC ENGINEERING, 2011, 卷号: 88, 期号: 8, 页码: 2509-2512
Authors:
Li, Xupeng
;
Shi, Sha
;
Zhang, Zhiyou
;
Wang, Jingquan
;
Li, Shuhong
;
Gao, Fuhua
;
Shi, Ruiying
;
Du, Jinglei
;
Du, Chunlei
;
Zhang, Yixiao
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Submit date：2015/09/21
Solid Immersion
Interference Lithography
Backside Exposure Technique
