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Department薄膜光学技术研究室(十一室)
Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique
Xiao, Shilei1; Li, Bincheng1; Cui, Hao1,2; Wang, Jing1
Source PublicationOPTICS LETTERS
Volume43Issue:4Pages:843-846
2018-02-15
Language英语
ISSN0146-9592
DOI10.1364/OL.43.000843
Indexed BySCI ; Ei
WOS IDWOS:000425123700055
EI Accession Number20180804810486
SubtypeJ
AbstractA polarized cavity ring-down technique was employed to precisely measure the residual stress birefringence of fused silica substrates with greatly enhanced measurement sensitivity. Intracavity birefringence resulted in beating of two orthogonally resonant modes in a Fabry-Perot cavity. The beating frequency of the ring-down decay was directly related to phase retardation induced by stress birefringence of optical components inside the cavity. For fused silica substrates, measurement reproducibilities of phase retardation of 2.38 x 10(-6) rad and of optical path difference of 2.4 x 10(-4) nm were experimentally achieved. In addition, spatially resolved mapping of stress birefringence of a fused silica substrate was obtained, which was in good agreement with that measured with a commercial stress birefringence measurement instrument. The experimental results demonstrated that cavity ring-down is a sensitive technique for stress birefringence measurements of optical components. (C) 2018 Optical Society of America
KeywordBirefringence Light measurement Substrates
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Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/9391
Collection薄膜光学技术研究室(十一室)
Affiliation1.School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu; 610054, China;
2.Institute of Optics and Electronics, Chinese Academy of Sciences, Shuangliu, Chengdu; 610209, China
Recommended Citation
GB/T 7714
Xiao, Shilei,Li, Bincheng,Cui, Hao,et al. Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique[J]. OPTICS LETTERS,2018,43(4):843-846.
APA Xiao, Shilei,Li, Bincheng,Cui, Hao,&Wang, Jing.(2018).Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique.OPTICS LETTERS,43(4),843-846.
MLA Xiao, Shilei,et al."Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique".OPTICS LETTERS 43.4(2018):843-846.
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