| Department | 薄膜光学技术研究室（十一室） |
| Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique | |
| Xiao, Shilei1; Li, Bincheng1; Cui, Hao1,2; Wang, Jing1 | |
| Source Publication | OPTICS LETTERS
 |
| Volume | 43Issue:4Pages:843-846 |
| 2018-02-15 | |
| Language | 英语 |
| ISSN | 0146-9592 |
| DOI | 10.1364/OL.43.000843 |
| Indexed By | SCI ; Ei |
| WOS ID | WOS:000425123700055 |
| EI Accession Number | 20180804810486 |
| Subtype | J |
| Abstract | A polarized cavity ring-down technique was employed to precisely measure the residual stress birefringence of fused silica substrates with greatly enhanced measurement sensitivity. Intracavity birefringence resulted in beating of two orthogonally resonant modes in a Fabry-Perot cavity. The beating frequency of the ring-down decay was directly related to phase retardation induced by stress birefringence of optical components inside the cavity. For fused silica substrates, measurement reproducibilities of phase retardation of 2.38 x 10(-6) rad and of optical path difference of 2.4 x 10(-4) nm were experimentally achieved. In addition, spatially resolved mapping of stress birefringence of a fused silica substrate was obtained, which was in good agreement with that measured with a commercial stress birefringence measurement instrument. The experimental results demonstrated that cavity ring-down is a sensitive technique for stress birefringence measurements of optical components. (C) 2018 Optical Society of America |
| Keyword | Birefringence Light measurement Substrates |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/9391 |
| Collection | 薄膜光学技术研究室（十一室） |
| Affiliation | 1.School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu; 610054, China; 2.Institute of Optics and Electronics, Chinese Academy of Sciences, Shuangliu, Chengdu; 610209, China |
| Recommended Citation GB/T 7714 | Xiao, Shilei,Li, Bincheng,Cui, Hao,et al. Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique[J]. OPTICS LETTERS,2018,43(4):843-846. |
| APA | Xiao, Shilei,Li, Bincheng,Cui, Hao,&Wang, Jing.(2018).Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique.OPTICS LETTERS,43(4),843-846. |
| MLA | Xiao, Shilei,et al."Sensitive measurement of stress birefringence of fused silica substrates with cavity ring-down technique".OPTICS LETTERS 43.4(2018):843-846. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2018-2189.pdf（1700KB） | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | Application Full Text | |
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