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Department微细加工光学技术国家重点实验室(开放室)
Large area deep subwavelength interference lithography with a 35 nm half-period based on bulk plasmon polaritons
Liu, Hongchao; Luo, Yunfei; Kong, Weijie; Liu, Kaipeng; Du, Wenjuan; Zhao, Chengwei; Gao, Ping; Zhao, Zeyu; Wang, Changtao; Pu, Mingbo; Luo, Xiangang
Source PublicationOPTICAL MATERIALS EXPRESS
Volume8Issue:2Pages:199-209
2018-02-01
Language英语
ISSN2159-3930
DOI10.1364/OME.8.000199
Indexed BySCI
WOS IDWOS:000425921600001
SubtypeJ
AbstractInterference lithography is an important method for fabricating periodical nano-structures. Its resolution, however, is limited with the minimum period being half the wavelength of light due to the diffraction limit. In this study, we presented bulk plasmon polariton (BPP) interference lithography with the resolution far beyond the diffraction limit. As a demonstrative result, a periodical line pattern of a 35 nm half-period (about 1/10 the wavelength of laser) over a large area (20 x 20 mm) was achieved in an experiment. The break of diffraction limit arises from exciting BPP modes with the high k(x) spatial frequency components inside hyperbolic metamaterial (HMM) composed by metal-dielectric multifilms. To enhance the contrast and intensity of the interference fringe field of two BPP modes, a metal cladding resist layer and optimized materials are employed. In addition, the period of interference patterns could be tuned by exciting BPP modes with variant kx spatial frequency. It is believed that the method with low cost, large area, and high resolution advantages has potential applications for manufacturing functional structures like gratings, polarizers, and photonic crystals, etc. (c) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
WOS KeywordPHOTONIC CRYSTALS ; EUV LITHOGRAPHY ; NANOLITHOGRAPHY ; DIFFRACTION ; FABRICATION ; SUPERLENS ; EXTREME
Citation statistics
Cited Times:7[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/9327
Collection微细加工光学技术国家重点实验室(开放室)
Recommended Citation
GB/T 7714
Liu, Hongchao,Luo, Yunfei,Kong, Weijie,et al. Large area deep subwavelength interference lithography with a 35 nm half-period based on bulk plasmon polaritons[J]. OPTICAL MATERIALS EXPRESS,2018,8(2):199-209.
APA Liu, Hongchao.,Luo, Yunfei.,Kong, Weijie.,Liu, Kaipeng.,Du, Wenjuan.,...&Luo, Xiangang.(2018).Large area deep subwavelength interference lithography with a 35 nm half-period based on bulk plasmon polaritons.OPTICAL MATERIALS EXPRESS,8(2),199-209.
MLA Liu, Hongchao,et al."Large area deep subwavelength interference lithography with a 35 nm half-period based on bulk plasmon polaritons".OPTICAL MATERIALS EXPRESS 8.2(2018):199-209.
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