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Wavefront-aberration measurement and systematic-error analysis of a high numerical-aperture objective
Liu, Zhixiang1,2,3; Xing, Tingwen1; Jiang, Yadong2; Lv, Baobin1,2,3
Source PublicationOptical Engineering
Volume57Issue:2Pages:024107
2018-02-01
Language英语
ISSN0091-3286
DOI10.1117/1.OE.57.2.024107
Indexed ByEi
EI Accession Number20181004852160
SubtypeJ
AbstractA two-dimensional (2-D) shearing interferometer based on an amplitude chessboard grating was designed to measure the wavefront aberration of a high numerical-aperture (NA) objective. Chessboard gratings offer better diffraction efficiencies and fewer disturbing diffraction orders than traditional cross gratings. The wavefront aberration of the tested objective was retrieved from the shearing interferogram using the Fourier transform and differential Zernike polynomial-fitting methods. Grating manufacturing errors, including the duty-cycle and pattern-deviation errors, were analyzed with the Fourier transform method. Then, according to the relation between the spherical pupil and planar detector coordinates, the influence of the distortion of the pupil coordinates was simulated. Finally, the systematic error attributable to grating alignment errors was deduced through the geometrical ray-tracing method. Experimental results indicate that the measuring repeatability (3σ) of the wavefront aberration of an objective with NA 0.4 was 3.4 mλ. The systematic-error results were consistent with previous analyses. Thus, the correct wavefront aberration can be obtained after calibration. © 2018 Society of Photo-Optical Instrumentation Engineers (SPIE).
KeywordDiffraction Diffraction gratings Interferometers Ray tracing Shearing Systematic errors Wavefronts
EI KeywordsDiffraction ; Diffraction gratings ; Interferometers ; Ray tracing ; Shearing ; Systematic errors ; Wavefronts
EI Classification Number604.1 Metal Cutting ; 741.1 Light/Optics ; 741.3 Optical Devices and Systems ; 941.3 Optical Instruments
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/9320
Collection超精总体部
Affiliation1.Chinese Academy of Sciences, Institute of Optics and Electronics, Chengdu, China;
2.University of Electronic Science and Technology of China, School of Optoelectronic Science and Engineering, Chengdu, China;
3.University of Chinese Academy of Sciences, Beijing, China
Recommended Citation
GB/T 7714
Liu, Zhixiang,Xing, Tingwen,Jiang, Yadong,et al. Wavefront-aberration measurement and systematic-error analysis of a high numerical-aperture objective[J]. Optical Engineering,2018,57(2):024107.
APA Liu, Zhixiang,Xing, Tingwen,Jiang, Yadong,&Lv, Baobin.(2018).Wavefront-aberration measurement and systematic-error analysis of a high numerical-aperture objective.Optical Engineering,57(2),024107.
MLA Liu, Zhixiang,et al."Wavefront-aberration measurement and systematic-error analysis of a high numerical-aperture objective".Optical Engineering 57.2(2018):024107.
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