| Department | 微电子装备总体研究室（四室） |
| Surface plasmons superresolution nanolithography technique by using polydimethylsiloxane soft mold based on light coupling | |
| He, Chuanwang1,2; Huang, Peng1,2; Fan, Bin1; Dong, Xiaochun1 | |
| Source Publication | EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS
 |
| Volume | 82Issue:3Pages:30401 |
| 2018-10-10 | |
| Language | 英语 |
| ISSN | 1286-0042 |
| DOI | 10.1051/epjap/2018180184 |
| Indexed By | SCI ; Ei |
| WOS ID | WOS:000447052100001 |
| EI Accession Number | 20184305969256 |
| Subtype | J |
| Abstract | We proposed a novel surface plasmons (SP) nanolithography technique based on light coupling, which adopts the polydimethylsiloxane (PDMS) soft mold to replace the ordinary hard mask. By using the light coupling effect of PDMS mold and the SP resonance effect of silver layer, the nanolithography technique could realize the superresolution lithography with a resolution of 1/10 of exposure wavelength and a high contrast ratio of 0.97. By the numerical simulation, we calculated the electric field distribution, analyzed the influence of the linewidth of PDMS soft mold and the thickness of silver layer on the proposed nanolithography system. The calculated results indicate the physics mechanism that the silver layer acts not only as an amplifier for high-frequency energy, but also as a blocker for the low-frequency energy. The optimal linewidth and silver layer thickness are obtained, which can promote the contrast ratio to 0.99. |
| Keyword | Electric fields High frequency amplifiers Microchannels Molds Nanolithography Optical resolving power Polydimethylsiloxane Silver Surface plasmons |
| WOS Keyword | NEXT-GENERATION LITHOGRAPHY ; FOCUSED-ION-BEAM ; INTERFERENCE NANOLITHOGRAPHY ; SILVER SUPERLENS ; DEEP-ULTRAVIOLET ; HARD MASK ; 157 NM ; TECHNOLOGY ; RESOLUTION ; LIMITS |
| EI Keywords | Electric fields ; High frequency amplifiers ; Microchannels ; Molds ; Nanolithography ; Optical resolving power ; Polydimethylsiloxane ; Silver ; Surface plasmons |
| EI Classification Number | 547.1 Precious Metals ; 701.1 Electricity: Basic Concepts and Phenomena ; 713.1 Amplifiers ; 741.1 Light/Optics ; 761 Nanotechnology ; 815.1.1 Organic Polymers ; 933 Solid State Physics |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/9276 |
| Collection | 微电子装备总体研究室（四室） |
| Affiliation | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China; 2.University of Chinese Academy of Sciences, Beijing; 100049, China |
| Recommended Citation GB/T 7714 | He, Chuanwang,Huang, Peng,Fan, Bin,et al. Surface plasmons superresolution nanolithography technique by using polydimethylsiloxane soft mold based on light coupling[J]. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS,2018,82(3):30401. |
| APA | He, Chuanwang,Huang, Peng,Fan, Bin,&Dong, Xiaochun.(2018).Surface plasmons superresolution nanolithography technique by using polydimethylsiloxane soft mold based on light coupling.EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS,82(3),30401. |
| MLA | He, Chuanwang,et al."Surface plasmons superresolution nanolithography technique by using polydimethylsiloxane soft mold based on light coupling".EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS 82.3(2018):30401. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2018-2043.pdf（1362KB） | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | Application Full Text | |
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