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Department微电子装备总体研究室(四室)
Surface plasmons superresolution nanolithography technique by using polydimethylsiloxane soft mold based on light coupling
He, Chuanwang1,2; Huang, Peng1,2; Fan, Bin1; Dong, Xiaochun1
Source PublicationEUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS
Volume82Issue:3Pages:30401
2018-10-10
Language英语
ISSN1286-0042
DOI10.1051/epjap/2018180184
Indexed BySCI ; Ei
WOS IDWOS:000447052100001
EI Accession Number20184305969256
SubtypeJ
AbstractWe proposed a novel surface plasmons (SP) nanolithography technique based on light coupling, which adopts the polydimethylsiloxane (PDMS) soft mold to replace the ordinary hard mask. By using the light coupling effect of PDMS mold and the SP resonance effect of silver layer, the nanolithography technique could realize the superresolution lithography with a resolution of 1/10 of exposure wavelength and a high contrast ratio of 0.97. By the numerical simulation, we calculated the electric field distribution, analyzed the influence of the linewidth of PDMS soft mold and the thickness of silver layer on the proposed nanolithography system. The calculated results indicate the physics mechanism that the silver layer acts not only as an amplifier for high-frequency energy, but also as a blocker for the low-frequency energy. The optimal linewidth and silver layer thickness are obtained, which can promote the contrast ratio to 0.99.
KeywordElectric fields High frequency amplifiers Microchannels Molds Nanolithography Optical resolving power Polydimethylsiloxane Silver Surface plasmons
WOS KeywordNEXT-GENERATION LITHOGRAPHY ; FOCUSED-ION-BEAM ; INTERFERENCE NANOLITHOGRAPHY ; SILVER SUPERLENS ; DEEP-ULTRAVIOLET ; HARD MASK ; 157 NM ; TECHNOLOGY ; RESOLUTION ; LIMITS
EI KeywordsElectric fields ; High frequency amplifiers ; Microchannels ; Molds ; Nanolithography ; Optical resolving power ; Polydimethylsiloxane ; Silver ; Surface plasmons
EI Classification Number547.1 Precious Metals ; 701.1 Electricity: Basic Concepts and Phenomena ; 713.1 Amplifiers ; 741.1 Light/Optics ; 761 Nanotechnology ; 815.1.1 Organic Polymers ; 933 Solid State Physics
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/9276
Collection微电子装备总体研究室(四室)
Affiliation1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China;
2.University of Chinese Academy of Sciences, Beijing; 100049, China
Recommended Citation
GB/T 7714
He, Chuanwang,Huang, Peng,Fan, Bin,et al. Surface plasmons superresolution nanolithography technique by using polydimethylsiloxane soft mold based on light coupling[J]. EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS,2018,82(3):30401.
APA He, Chuanwang,Huang, Peng,Fan, Bin,&Dong, Xiaochun.(2018).Surface plasmons superresolution nanolithography technique by using polydimethylsiloxane soft mold based on light coupling.EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS,82(3),30401.
MLA He, Chuanwang,et al."Surface plasmons superresolution nanolithography technique by using polydimethylsiloxane soft mold based on light coupling".EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS 82.3(2018):30401.
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