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The optical and electrical properties of ZnO:Al thin films deposited at low temperatures by RF magnetron sputtering
Tang, Ping1,2; Li, Bing2; Feng, Lianghuan2
Source PublicationCERAMICS INTERNATIONAL
Volume44Issue:4Pages:4154-4157
2018-03-01
Language英语
ISSN0272-8842
DOI10.1016/j.ceramint.2017.11.216
Indexed BySCI ; Ei
WOS IDWOS:000424716200083
EI Accession Number20174904506013
SubtypeJ
AbstractSeveral ZnO:Al thin films have been successfully deposited on glass substrates at different substrate temperatures by RF (radio frequency) magnetron sputtering method. Effects of the substrate temperatures on the optical and electrical properties of these ZnO:Al thin films were investigated. The UV-VIS-NIR spectra of the ZnO:Al thin films revealed that the average optical transmittances in the visible range are very high, up to 88%. X-ray diffraction results showed that crystallization of these films was improved at higher substrate temperature. The band gaps of ZnO:Al thin films deposited at 25 degrees C, 150 degrees C, 200 degrees C, and 250 degrees C are 3.59 eV, 3.55 eV, 3.53 eV, and 3.48 eV, respectively. The Hall-effect measurement demonstrated that the electrical resistivity of the films decreased with the increase of the substrate temperature and the electrical resistivity reached 1.990 x 10(-3) Omega cm at 250 degrees C.
KeywordZnO:Al films Magnetron sputtering Low substrate temperatures
WOS KeywordPULSED-LASER DEPOSITION ; SURFACE ; GLASS
EI KeywordsElectric conductivity ; Energy gap ; II-VI semiconductors ; Magnetron sputtering ; Substrates ; Ultraviolet spectroscopy ; X ray diffraction ; Zinc oxide
EI Classification Number701.1 Electricity: Basic Concepts and Phenomena ; 804.2 Inorganic Compounds
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Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/9269
Collection微细加工光学技术国家重点实验室(开放室)
Affiliation1.State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu; 610209, China;
2.College of Materials Science and Engineering, Sichuan University, Chengdu; 610064, China
Recommended Citation
GB/T 7714
Tang, Ping,Li, Bing,Feng, Lianghuan. The optical and electrical properties of ZnO:Al thin films deposited at low temperatures by RF magnetron sputtering[J]. CERAMICS INTERNATIONAL,2018,44(4):4154-4157.
APA Tang, Ping,Li, Bing,&Feng, Lianghuan.(2018).The optical and electrical properties of ZnO:Al thin films deposited at low temperatures by RF magnetron sputtering.CERAMICS INTERNATIONAL,44(4),4154-4157.
MLA Tang, Ping,et al."The optical and electrical properties of ZnO:Al thin films deposited at low temperatures by RF magnetron sputtering".CERAMICS INTERNATIONAL 44.4(2018):4154-4157.
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