| Department | 自适应光学技术研究室（八室） |
| Calibration of focusing lens artifacts in a dual rotating-compensator Mueller matrix ellipsometer | |
| Fan, Zhentao1,2,3; Tang, Yuanyuan1,2; Wei, Kai1,2; Zhang, Yudong1,2 | |
| Source Publication | APPLIED OPTICS
 |
| Volume | 57Issue:15Pages:4145-4152 |
| 2018-05-20 | |
| Language | 英语 |
| ISSN | 1559-128X |
| DOI | 10.1364/AO.57.004145 |
| Indexed By | SCI ; Ei |
| WOS ID | WOS:000432497400019 |
| EI Accession Number | 20182105233484 |
| Subtype | J |
| Abstract | A focusing lens consisting of two or more elements is widely used in ellipsometers for spatial resolution. In a typical ellipsometer layout, a lens is placed before the sample to focus light emerging to the sample, and another after the sample to collect the scattered light from the sample. Accurately calibrating the artifacts of the focusing lens is of great importance. In this paper, a method to improve calibration accuracy is proposed. A general analytical model is deduced to describe the artifacts of the focusing lens. This model can be applied to a system model of a dual rotating-compensator Mueller matrix ellipsometer. By adding a uniaxial crystal to calibration samples, with its optical axis neither parallel nor perpendicular to the incident plane, we can better separate artifacts from the lens before and after the sample. The system model also includes depolarization effects due to a finite numerical aperture (NA) that is related to the focusing lens. Similar effects due to the finite spectral bandwidth are also considered. Our simulation's results have validated the proposed method. (C) 2018 Optical Society of America |
| Keyword | Calibration Ellipsometry Focusing Light measurement Matrix algebra |
| WOS Keyword | MULTICHANNEL ELLIPSOMETER ; IN-SITU ; BIREFRINGENCE ; SPECTROSCOPY ; COEFFICIENTS ; CALCULUS ; FORMULAS ; SURFACES ; WINDOWS |
| EI Keywords | Calibration ; Ellipsometry ; Focusing ; Light measurement ; Matrix algebra |
| EI Classification Number | 741.3 Optical Devices and Systems ; 921.1 Algebra ; 941.4 Optical Variables Measurements |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/9253 |
| Collection | 自适应光学技术研究室（八室） |
| Affiliation | 1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China; 2.Key Laboratory on Adaptive Optics, Chinese Academy of Sciences, Chengdu; 610209, China; 3.University of Chinese Academy of Sciences, Beijing; 100049, China |
| Recommended Citation GB/T 7714 | Fan, Zhentao,Tang, Yuanyuan,Wei, Kai,et al. Calibration of focusing lens artifacts in a dual rotating-compensator Mueller matrix ellipsometer[J]. APPLIED OPTICS,2018,57(15):4145-4152. |
| APA | Fan, Zhentao,Tang, Yuanyuan,Wei, Kai,&Zhang, Yudong.(2018).Calibration of focusing lens artifacts in a dual rotating-compensator Mueller matrix ellipsometer.APPLIED OPTICS,57(15),4145-4152. |
| MLA | Fan, Zhentao,et al."Calibration of focusing lens artifacts in a dual rotating-compensator Mueller matrix ellipsometer".APPLIED OPTICS 57.15(2018):4145-4152. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2018-2020.pdf（977KB） | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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