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Calibration of focusing lens artifacts in a dual rotating-compensator Mueller matrix ellipsometer
Fan, Zhentao1,2,3; Tang, Yuanyuan1,2; Wei, Kai1,2; Zhang, Yudong1,2
Source PublicationAPPLIED OPTICS
Volume57Issue:15Pages:4145-4152
2018-05-20
Language英语
ISSN1559-128X
DOI10.1364/AO.57.004145
Indexed BySCI ; Ei
WOS IDWOS:000432497400019
EI Accession Number20182105233484
SubtypeJ
AbstractA focusing lens consisting of two or more elements is widely used in ellipsometers for spatial resolution. In a typical ellipsometer layout, a lens is placed before the sample to focus light emerging to the sample, and another after the sample to collect the scattered light from the sample. Accurately calibrating the artifacts of the focusing lens is of great importance. In this paper, a method to improve calibration accuracy is proposed. A general analytical model is deduced to describe the artifacts of the focusing lens. This model can be applied to a system model of a dual rotating-compensator Mueller matrix ellipsometer. By adding a uniaxial crystal to calibration samples, with its optical axis neither parallel nor perpendicular to the incident plane, we can better separate artifacts from the lens before and after the sample. The system model also includes depolarization effects due to a finite numerical aperture (NA) that is related to the focusing lens. Similar effects due to the finite spectral bandwidth are also considered. Our simulation's results have validated the proposed method. (C) 2018 Optical Society of America
KeywordCalibration Ellipsometry Focusing Light measurement Matrix algebra
WOS KeywordMULTICHANNEL ELLIPSOMETER ; IN-SITU ; BIREFRINGENCE ; SPECTROSCOPY ; COEFFICIENTS ; CALCULUS ; FORMULAS ; SURFACES ; WINDOWS
EI KeywordsCalibration ; Ellipsometry ; Focusing ; Light measurement ; Matrix algebra
EI Classification Number741.3 Optical Devices and Systems ; 921.1 Algebra ; 941.4 Optical Variables Measurements
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/9253
Collection自适应光学技术研究室(八室)
Affiliation1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China;
2.Key Laboratory on Adaptive Optics, Chinese Academy of Sciences, Chengdu; 610209, China;
3.University of Chinese Academy of Sciences, Beijing; 100049, China
Recommended Citation
GB/T 7714
Fan, Zhentao,Tang, Yuanyuan,Wei, Kai,et al. Calibration of focusing lens artifacts in a dual rotating-compensator Mueller matrix ellipsometer[J]. APPLIED OPTICS,2018,57(15):4145-4152.
APA Fan, Zhentao,Tang, Yuanyuan,Wei, Kai,&Zhang, Yudong.(2018).Calibration of focusing lens artifacts in a dual rotating-compensator Mueller matrix ellipsometer.APPLIED OPTICS,57(15),4145-4152.
MLA Fan, Zhentao,et al."Calibration of focusing lens artifacts in a dual rotating-compensator Mueller matrix ellipsometer".APPLIED OPTICS 57.15(2018):4145-4152.
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