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Effect of oxygen flux on stress and optical properties of Ta2O5 using Ion-beam sputtering
Yu, Qi1,2,3; Fan, Jun-Qi1,2; Guan, Chun-Lin1,2
2017
Conference NameProceedings of SPIE: Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016
Source Publication0277-786X
Volume10255
Pages102551E
AbstractThe ion-beam sputtering deposition is a good technique for making low scattering coatings. In this work, the Ta2O5thin films as the oxygen flux (15-35sccm) were prepared on the K9 glass using the single ion-beam sputtering. As the oxygen flux increased, the thickness of films with the same deposited time decreased from 936.67nm to 837.87nm. The refractive index was 2.075 in 1000nm at 30 sccm. The stress increased along with the increasing of oxygen flux. In the work, the compressive stress increased from 319.55 Mpa to 410.92 Mpa. © 2017 SPIE.
KeywordCompressive stress - Ion beams - Ions - Optical properties - Oxygen - Refractive index - Sputtering - Stresses - Tantalum oxides - Thin films
Indexed ByEi
Language英语
EI Classification Number2017-2171
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/9039
Collection自适应光学技术研究室(八室)
Affiliation1.Key Laboratory of Adaptive Optics, Chinese Academy of Science, Chengdu Sichuan; 610209, China;
2.Institute of Optics and Electronics, Chinese Academy of Science, Chengdu Sichuan; 610209, China;
3.University of Chinese Academy of Science, Beijing; 100049, China
Recommended Citation
GB/T 7714
Yu, Qi,Fan, Jun-Qi,Guan, Chun-Lin. Effect of oxygen flux on stress and optical properties of Ta2O5 using Ion-beam sputtering[C],2017:102551E.
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