IOE OpenIR  > 自适应光学技术研究室(八室)
Preparation and damage characteristics of broad bandwidth HR films for picoseconds laser system
Long, Guoyun; Zhang, Yaoping; Fan, Junqi
2017
会议名称Proceedings of SPIE: Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016
会议录名称0277-786X
卷号10255
页码102551B
摘要High reflection films for 800nm picoseconds laser system requires broad bandwidth, which is usually about ±50nm, or even to ±70nm, and a high laser damage threshold is needed at the same time. Multilayer dielectrics using three materials Nb2O5/SiO2-HfO2/SiO2were fabricated by electron beam evaporation. Benefit from its high refractive index of Nb2O5and the high damage threshold of HfO2films, the multilayer dielectrics were prepared successfully, which have more than 99.5% reflectance within bandwidth larger than 140nm around the center wavelength of 800 nm. The laser damage characteristics of the films at 150ps, 1Hz were studied, and the damage mechanism was analyzed. © 2017 SPIE.
关键词Bandwidth - Dielectric materials - Film preparation - Hafnium oxides - Multilayer films - Multilayers - Niobium oxide - Refractive index
收录类别Ei
语种英语
EI分类号2017-2170
文献类型会议论文
条目标识符http://ir.ioe.ac.cn/handle/181551/9038
专题自适应光学技术研究室(八室)
作者单位Institute of Optics and Electronics, Chinese Academy of Science, Chengdu; 610209, China
推荐引用方式
GB/T 7714
Long, Guoyun,Zhang, Yaoping,Fan, Junqi. Preparation and damage characteristics of broad bandwidth HR films for picoseconds laser system[C],2017:102551B.
条目包含的文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
2017-2170.pdf(536KB)会议论文 开放获取CC BY-NC-SA请求全文
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Long, Guoyun]的文章
[Zhang, Yaoping]的文章
[Fan, Junqi]的文章
百度学术
百度学术中相似的文章
[Long, Guoyun]的文章
[Zhang, Yaoping]的文章
[Fan, Junqi]的文章
必应学术
必应学术中相似的文章
[Long, Guoyun]的文章
[Zhang, Yaoping]的文章
[Fan, Junqi]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。