Knowledge Management System Of Institute of optics and electronics, CAS
| Etching hard brittle optical materials by masked ion beam | |
| Li, Yun; Fu, Taotao; Jia, Xin; Xing, Tingwen | |
| Source Publication | 0277-786X |
| Volume | 10448 |
| Pages | 1044809 |
| 2017 | |
| Language | 英语 |
| Indexed By | Ei |
| Abstract | The fabrication of small size aspheric optical surface, which made of hard brittle materials, usually uses optical cold processing. However, it is difficult to achieve the ideal requirements of the surface accuracy and roughness. In order to solve this problem, the masked ion beam figuring method is used to etch the one-dimension structure on the plat surface which made of hard brittle material. The results show that the expected surface profile is acquired and meanwhile mainly kept the original roughness and mid-frequency. It provides a possible way for fabricating small size aspheric optics which made of hard brittle materials. Copyright © 2017 SPIE. |
| Keyword | Brittleness - Ions - Masks - Surface roughness |
| Conference Name | Proceedings of SPIE: Optifab 2017 |
| EI Classification Number | 2017-2165 |
| Document Type | 会议论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/9033 |
| Collection | 超精总体部 |
| Affiliation | Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China |
| Recommended Citation GB/T 7714 | Li, Yun,Fu, Taotao,Jia, Xin,et al. Etching hard brittle optical materials by masked ion beam[C],2017:1044809. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2017-2165.pdf（339KB） | 会议论文 | 开放获取 | CC BY-NC-SA | Application Full Text | ||
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