Etching hard brittle optical materials by masked ion beam

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	Etching hard brittle optical materials by masked ion beam
	Li, Yun; Fu, Taotao; Jia, Xin; Xing, Tingwen
	2017
会议名称	Proceedings of SPIE: Optifab 2017
会议录名称	0277-786X
卷号	10448
页码	1044809
摘要	The fabrication of small size aspheric optical surface, which made of hard brittle materials, usually uses optical cold processing. However, it is difficult to achieve the ideal requirements of the surface accuracy and roughness. In order to solve this problem, the masked ion beam figuring method is used to etch the one-dimension structure on the plat surface which made of hard brittle material. The results show that the expected surface profile is acquired and meanwhile mainly kept the original roughness and mid-frequency. It provides a possible way for fabricating small size aspheric optics which made of hard brittle materials. Copyright © 2017 SPIE.
关键词	Brittleness - Ions - Masks - Surface roughness
收录类别	Ei
语种	英语
EI分类号	2017-2165
文献类型	会议论文
条目标识符	http://ir.ioe.ac.cn/handle/181551/9033
专题	超精密总体部
作者单位	Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China
推荐引用方式 GB/T 7714	Li, Yun,Fu, Taotao,Jia, Xin,et al. Etching hard brittle optical materials by masked ion beam[C],2017:1044809.