IOE OpenIR  > 薄膜光学技术研究室(十一室)
双离子束溅射中红外SiO2薄膜热稳定性研究(英文)
尚鹏; 季一勤; 赵道林; 熊胜明; 刘华松; 李凌辉; 田东
2017
Source Publication光子学报
ISSN1004-4213
Volume46Issue:8Pages:102-108
Language中文
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8941
Collection薄膜光学技术研究室(十一室)
Recommended Citation
GB/T 7714
尚鹏,季一勤,赵道林,等. 双离子束溅射中红外SiO2薄膜热稳定性研究(英文)[J]. 光子学报,2017,46(8):102-108.
APA 尚鹏.,季一勤.,赵道林.,熊胜明.,刘华松.,...&田东.(2017).双离子束溅射中红外SiO2薄膜热稳定性研究(英文).光子学报,46(8),102-108.
MLA 尚鹏,et al."双离子束溅射中红外SiO2薄膜热稳定性研究(英文)".光子学报 46.8(2017):102-108.
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