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Analysis of spurious diffraction orders of computer-generated hologram in symmetric aspheric metrology
He, Yiwei1,2,3; Hou, Xi1; Wu, Fan1; Ma, Xinxue4; Liang, Rongguang2
Source PublicationOptics Express
Volume25Issue:17Pages:20556-20572
2017
Language英语
ISSN1094-4087
AbstractComputer-generated hologram (CGH) has been widely used as a wavefront compensator in symmetric aspheric metrology. As a diffractive element, it generates different diffraction orders, but only the 1st-order diffraction is used to test aspheric surface. The light from spurious diffraction orders (SDO) will produce many high-frequency fringes in interferogram and reduce measurement accuracy. In this paper, we regard the CGH null system as an imaging system and develop an aberration model in Seidel formalism to analyze the SDO. This model has the advantage to address the difference between the SDO (k1, k2) and (k2, k1). We consider the effect of the pupil distortion so that our model can analyze the SDO with a large pupil distortion. We derive the condition to ensure the 2nd-order and 4th-order aberrations have the same sign and calculate the minimum defocused distance (power carrier frequency) of CGH. According to the marginal-ray heights (h1and h3) on the CGH in the first and second passes, we determine the condition that the SDO covers the whole CGH in the second pass. We analyze the SDO of 4 CGH designs and compare the results from our aberration model with these from real ray trace. These results validate that our aberration model is feasible whether the aspheric part is convex or concave and whether CGH is inside or outside the focus of the transmission sphere. ©2017 Optical Society of America.
KeywordAspherics - Diffraction - Electron holography - Holograms - Imaging systems - Units of measurement
Indexed BySCI ; Ei
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8873
Collection先光中心
Affiliation1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; Sichuan; 610209, China;
2.College of Optical Sciences, University of Arizona, Tucson; AZ; 85721, United States;
3.University of Chinese Academy of Sciences, Beijing; 100039, China;
4.Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun; 130033, China
Recommended Citation
GB/T 7714
He, Yiwei,Hou, Xi,Wu, Fan,et al. Analysis of spurious diffraction orders of computer-generated hologram in symmetric aspheric metrology[J]. Optics Express,2017,25(17):20556-20572.
APA He, Yiwei,Hou, Xi,Wu, Fan,Ma, Xinxue,&Liang, Rongguang.(2017).Analysis of spurious diffraction orders of computer-generated hologram in symmetric aspheric metrology.Optics Express,25(17),20556-20572.
MLA He, Yiwei,et al."Analysis of spurious diffraction orders of computer-generated hologram in symmetric aspheric metrology".Optics Express 25.17(2017):20556-20572.
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