| Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons | |
| Liu, Hongchao1; Kong, Weijie; Liu, Kaipeng; Zhao, Chengwei; Du, Wenjuan1; Wang, Changtao; Liu, Ling1; Gao, Ping; Pu, Mingbo; Luo, Xiangang | |
| 2017 | |
| 发表期刊 | Optics Express
 |
| ISSN | 1094-4087 |
| 卷号 | 25期号:17页码:20511-20521 |
| 摘要 | Interference lithography based on surface plasmon polaritons has been proven to break the diffraction limit and deliver the high imaging resolution. However, most previously reported studies suffer from the inflexible pattern pitch for a certain structure ascribed to fixed excitation mode, which limits the applications in micro-/nano- fabrications. In this work, the large area deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons (BPPs) is proposed. By simply tuning the incident angle, the spatial frequencies of the selected BPPs modes squeezed through hyperbolic metamaterial changes correspondingly. As a result, the pitch of the interference pattern is continuously altered. The results demonstrate that one-dimensional and two-dimensional periodic patterns with pitch resolution ranging from 45 nm (similar to lambda/10) to 115 nm (similar to lambda/4) can be generated under 436 nm illumination. Additionally, the general method of designing such an interference lithography system is also discussed, which can be used for nanoscale fabrication in this fashion. (C) 2017 Optical Society of America |
| 关键词 | HIGH-ASPECT-RATIO PHOTONIC CRYSTALS EUV LITHOGRAPHY FABRICATION DIFFRACTION NANOLITHOGRAPHY EXTREME |
| 收录类别 | SCI |
| 语种 | 英语 |
| 文献类型 | 期刊论文 |
| 条目标识符 | http://ir.ioe.ac.cn/handle/181551/8871 |
| 专题 | 微细加工光学技术国家重点实验室（开放室） |
| 作者单位 | 1.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, POB 350, Chengdu 610209, Sichuan, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China |
| 推荐引用方式 GB/T 7714 | Liu, Hongchao,Kong, Weijie,Liu, Kaipeng,et al. Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons[J]. Optics Express,2017,25(17):20511-20521. |
| APA | Liu, Hongchao.,Kong, Weijie.,Liu, Kaipeng.,Zhao, Chengwei.,Du, Wenjuan.,...&Luo, Xiangang.(2017).Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons.Optics Express,25(17),20511-20521. |
| MLA | Liu, Hongchao,et al."Deep subwavelength interference lithography with tunable pattern period based on bulk plasmon polaritons".Optics Express 25.17(2017):20511-20521. |
| 条目包含的文件 | ||||||
| 文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
| 2017-2111.pdf（6898KB） | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | 请求全文 | |
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