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Pushing the plasmonic imaging nanolithography to nano-manufacturing
Gao, Ping; Li, Xiong; Zhao, Zeyu; Ma, Xiaoliang; Pu, Mingbo; Wang, Changtao; Luo, Xiangang
2017
Source PublicationOptics Communications
ISSN0030-4018
Volume404Pages:62-72
AbstractSuffering from the so-called diffraction limit, the minimum resolution of conventional photolithography is limited to λ2 or λ4, where λ is the incident wavelength. The physical mechanism of this limit lies at the fact that the evanescent waves that carry subwavelength information of the object decay exponentially in a medium, and cannot reach the image plane. Surface plasmons (SPs) are non-radiative electromagnetic waves that propagate along the interface between metal and dielectric, which exhibits unique sub-diffraction optical characteristics. In recent years, benefiting from SPs’ features, researchers have proposed a variety of plasmonic lithography methods in the manner of interference, imaging and direct writing, and have demonstrated that sub-diffraction resolution could be achieved by theoretical simulations or experiments. Among the various plasmonic lithography modes, plasmonic imaging lithography seems to be of particular importance for applications due to its compatibility with conventional lithography. Recent results show that the half pitch of nanograting can be shrinked down to 22 nm and even 16 nm. This paper will give an overview of research progress, representative achievements of plasmonic imaging lithography, the remained problems and outlook of further developments. © 2017 Elsevier B.V.
KeywordDiffraction - Electromagnetic waves - Lithography - Nanolithography - Photolithography - Surface plasmon resonance
Indexed BySCI ; Ei
Language英语
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8863
Collection微细加工光学技术国家重点实验室(开放室)
AffiliationState Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu; 610209, China
Recommended Citation
GB/T 7714
Gao, Ping,Li, Xiong,Zhao, Zeyu,et al. Pushing the plasmonic imaging nanolithography to nano-manufacturing[J]. Optics Communications,2017,404:62-72.
APA Gao, Ping.,Li, Xiong.,Zhao, Zeyu.,Ma, Xiaoliang.,Pu, Mingbo.,...&Luo, Xiangang.(2017).Pushing the plasmonic imaging nanolithography to nano-manufacturing.Optics Communications,404,62-72.
MLA Gao, Ping,et al."Pushing the plasmonic imaging nanolithography to nano-manufacturing".Optics Communications 404(2017):62-72.
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