| Pushing the plasmonic imaging nanolithography to nano-manufacturing | |
| Gao, Ping; Li, Xiong; Zhao, Zeyu; Ma, Xiaoliang; Pu, Mingbo; Wang, Changtao; Luo, Xiangang | |
| Source Publication | Optics Communications
 |
| Volume | 404Pages:62-72 |
| 2017 | |
| Language | 英语 |
| ISSN | 0030-4018 |
| Indexed By | SCI ; Ei |
| Abstract | Suffering from the so-called diffraction limit, the minimum resolution of conventional photolithography is limited to λ2 or λ4, where λ is the incident wavelength. The physical mechanism of this limit lies at the fact that the evanescent waves that carry subwavelength information of the object decay exponentially in a medium, and cannot reach the image plane. Surface plasmons (SPs) are non-radiative electromagnetic waves that propagate along the interface between metal and dielectric, which exhibits unique sub-diffraction optical characteristics. In recent years, benefiting from SPs’ features, researchers have proposed a variety of plasmonic lithography methods in the manner of interference, imaging and direct writing, and have demonstrated that sub-diffraction resolution could be achieved by theoretical simulations or experiments. Among the various plasmonic lithography modes, plasmonic imaging lithography seems to be of particular importance for applications due to its compatibility with conventional lithography. Recent results show that the half pitch of nanograting can be shrinked down to 22 nm and even 16 nm. This paper will give an overview of research progress, representative achievements of plasmonic imaging lithography, the remained problems and outlook of further developments. © 2017 Elsevier B.V. |
| Keyword | Diffraction - Electromagnetic waves - Lithography - Nanolithography - Photolithography - Surface plasmon resonance |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/8863 |
| Collection | 微细加工光学技术国家重点实验室（开放室） |
| Affiliation | State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu; 610209, China |
| Recommended Citation GB/T 7714 | Gao, Ping,Li, Xiong,Zhao, Zeyu,et al. Pushing the plasmonic imaging nanolithography to nano-manufacturing[J]. Optics Communications,2017,404:62-72. |
| APA | Gao, Ping.,Li, Xiong.,Zhao, Zeyu.,Ma, Xiaoliang.,Pu, Mingbo.,...&Luo, Xiangang.(2017).Pushing the plasmonic imaging nanolithography to nano-manufacturing.Optics Communications,404,62-72. |
| MLA | Gao, Ping,et al."Pushing the plasmonic imaging nanolithography to nano-manufacturing".Optics Communications 404(2017):62-72. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2017-2103.pdf（3875KB） | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | Application Full Text | |
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