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Orthogonal experiment and analysis of power spectral density on process parameters of pitch tool polishing
Meng, Kai1; Wan, Yongjian; Wu, Fan; Shen, Lijun1; Wu, Hsing-Yu
Source PublicationOPTICAL REVIEW
Volume24Issue:1Pages:1-10
2017
Language英语
ISSN1340-6000
AbstractMid to high spatial frequency error (MSFR and HSFR) should be strictly controlled in modern optical systems. Pitch tool polishing (PTP) is an effective ultra smoothing surface manufacturing method to control MSFR and HSFR. But it is difficult to control because it is affected by a lot of factors. The present paper describes the pitch tool polishing study based on eighteen well-planned orthogonal experiments (OA(18) matrix). Five main process factors (abrasive particle size, slurry concentration, pad rotation speed, acidity and polishing time) in pitch tool polishing process were investigated. In this study, power spectral density (PSD) based on Fourier analysis of surface topography data obtained by white light interferometer was used as the results of orthogonal experiments instead of material removal rate and surface roughness. A normalization method of PSD was proposed as the range analysis rule. Three parts of spatial frequency bandwidth were selected and discussed. Acidity is the most important factor in part 1 and slurry concentration is the most significant one in part 2; while acidity is the least influenced one in part 3. The result in each part was explained by two-step material removal mechanism. At last, suggestions in low and high spatial frequency are given for pitch tool polishing.
KeywordPitch tool polishing Orthogonal experiment Power spectral density Spatial frequency error
Indexed BySCI
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8852
Collection先光中心
Affiliation1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
3.OpTIC Glyndwr, Natl Facil Ultra Precis Surfaces, St Asaph LL17 0JD, N Wales, Wales
4.UCL, Dept Phys & Astron, Gower St, London WC1E 6BT, England
Recommended Citation
GB/T 7714
Meng, Kai,Wan, Yongjian,Wu, Fan,et al. Orthogonal experiment and analysis of power spectral density on process parameters of pitch tool polishing[J]. OPTICAL REVIEW,2017,24(1):1-10.
APA Meng, Kai,Wan, Yongjian,Wu, Fan,Shen, Lijun,&Wu, Hsing-Yu.(2017).Orthogonal experiment and analysis of power spectral density on process parameters of pitch tool polishing.OPTICAL REVIEW,24(1),1-10.
MLA Meng, Kai,et al."Orthogonal experiment and analysis of power spectral density on process parameters of pitch tool polishing".OPTICAL REVIEW 24.1(2017):1-10.
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