| Thermal Stability of Mid-infrared SiO2Thin Films Deposited by Dual Ion Beam Sputtering Method | |
| Shang, Peng1,2; Ji, Yi-Qin1; Zhao, Dao-Ling3; Xiong, Sheng-Ming4; Liu, Hua-Song1; Li, Ling-Hui4; Tian, Dong4 | |
| 2017 | |
| 发表期刊 | Guangzi Xuebao/Acta Photonica Sinica
 |
| ISSN | 10044213 |
| 卷号 | 46期号:8页码:0816003 |
| 摘要 | SiO2films are deposited on Si and sapphire (α-Al2O3) substrates by Dual Ion beam sputtering method. The microstructure, surface morphology, residual stress and optical stability of SiO2coating in the wavelength of 0.4~1.2 μm and 3~5 μm are investigated, systematically. The results indicate that the residual stress goes through a local minimum value at ~400. There is a close relationship between the optical constant and the surface conditions, residual stress, microstructure of SiO2film. As the temperature increases up to 1 000, SiO2film can keep well thermal stability without notable damage morphology. The result can give some guidance for designing the optical coatings used in harsh environments. © 2017, Science Press. All right reserved. |
| 关键词 | Ions - Microstructure - Optical coatings - Residual stresses - Sapphire - Silica - Sputtering - Stability - Thermodynamic stability - Thin films |
| 收录类别 | Ei |
| 语种 | 英语 |
| 文献类型 | 期刊论文 |
| 条目标识符 | http://ir.ioe.ac.cn/handle/181551/8803 |
| 专题 | 薄膜光学技术研究室（十一室） |
| 作者单位 | 1.Tianjin Key Laboratory of Optical Thin Film, Tianjin Jin Hang Institute Technical Physics, Tianjin; 300192, China; 2.State Key Labs of Modern Optical Instrumentation, Zhejiang University, Hangzhou; 310027, China; 3.Shandong Institute of Metrology, Jinan; 250014, China; 4.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China |
| 推荐引用方式 GB/T 7714 | Shang, Peng,Ji, Yi-Qin,Zhao, Dao-Ling,et al. Thermal Stability of Mid-infrared SiO2Thin Films Deposited by Dual Ion Beam Sputtering Method[J]. Guangzi Xuebao/Acta Photonica Sinica,2017,46(8):0816003. |
| APA | Shang, Peng.,Ji, Yi-Qin.,Zhao, Dao-Ling.,Xiong, Sheng-Ming.,Liu, Hua-Song.,...&Tian, Dong.(2017).Thermal Stability of Mid-infrared SiO2Thin Films Deposited by Dual Ion Beam Sputtering Method.Guangzi Xuebao/Acta Photonica Sinica,46(8),0816003. |
| MLA | Shang, Peng,et al."Thermal Stability of Mid-infrared SiO2Thin Films Deposited by Dual Ion Beam Sputtering Method".Guangzi Xuebao/Acta Photonica Sinica 46.8(2017):0816003. |
| 条目包含的文件 | ||||||
| 文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
| 2017-2043.pdf（2071KB） | 期刊论文 | 出版稿 | 开放获取 | CC BY-NC-SA | 请求全文 | |
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。
修改评论