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Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography
Liang, Gao-Feng1,2; Jiao, Jiao1; Luo, Xian-Gang2; Zhao, Qing1
Source PublicationChinese Physics B
Volume26Issue:1Pages:016801
2017
Language英语
ISSN1674-1056
Indexed BySCI ; Ei
AbstractThe silver (Ag)/photoresist (PR)/Ag structure, widely used in plasmonic photolithography, is fabricated on silicon substrate. The surface roughness of the top Ag film is measured and analyzed systematically. In particular, combined with template stripping technology, the lower side of the top Ag film is imaged by an atomic force microscope. The topographies show that the lower side surface is rougher than the initial surface of the subjacent PR film, which is mainly attributable to the deformation caused by particle collisions during the deposition of the Ag film. Additionally, further measurements show that the Ag film deposited on the PR exhibits a flatter upper side morphology than that directly deposited on the silicon substrate. This is explained by the different growth modes of Ag films on different substrates. This work will be beneficial to morphology analysis and performance evaluation for the films in optical and plasmonic devices. © 2017 Chinese Physical Society and IOP Publishing Ltd.
KeywordAtomic force microscopy - Deposition - Lithography - Photolithography - Plasmons - Substrates - Surface roughness
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8795
Collection微细加工光学技术国家重点实验室(开放室)
Affiliation1.School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu; 610054, China;
2.State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China
Recommended Citation
GB/T 7714
Liang, Gao-Feng,Jiao, Jiao,Luo, Xian-Gang,et al. Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography[J]. Chinese Physics B,2017,26(1):016801.
APA Liang, Gao-Feng,Jiao, Jiao,Luo, Xian-Gang,&Zhao, Qing.(2017).Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography.Chinese Physics B,26(1),016801.
MLA Liang, Gao-Feng,et al."Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography".Chinese Physics B 26.1(2017):016801.
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