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用多光束干涉实现纳米级阵列图形的长焦深光刻
张锦; 冯伯儒; 郭永康
Source Publication光电工程
Volume31Issue:3Pages:8-11
2004
Language中文
Indexed ByEi
Subtype期刊论文
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/873
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding Author张锦
Recommended Citation
GB/T 7714
张锦,冯伯儒,郭永康. 用多光束干涉实现纳米级阵列图形的长焦深光刻[J]. 光电工程,2004,31(3):8-11.
APA 张锦,冯伯儒,&郭永康.(2004).用多光束干涉实现纳米级阵列图形的长焦深光刻.光电工程,31(3),8-11.
MLA 张锦,et al."用多光束干涉实现纳米级阵列图形的长焦深光刻".光电工程 31.3(2004):8-11.
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