IOE OpenIR  > 微细加工光学技术国家重点实验室(开放室)
Classical simulation of atomic beam focusing and deposition for atom lithography
Xianzhong Chen; Hanmin Yao; Xunan Chen
Source PublicationChinese Optics Letters
Volume2Issue:4Pages:187-189
2004
Language英语
Indexed ByEi
Subtype期刊论文
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/861
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorXianzhong Chen
Recommended Citation
GB/T 7714
Xianzhong Chen,Hanmin Yao,Xunan Chen. Classical simulation of atomic beam focusing and deposition for atom lithography[J]. Chinese Optics Letters,2004,2(4):187-189.
APA Xianzhong Chen,Hanmin Yao,&Xunan Chen.(2004).Classical simulation of atomic beam focusing and deposition for atom lithography.Chinese Optics Letters,2(4),187-189.
MLA Xianzhong Chen,et al."Classical simulation of atomic beam focusing and deposition for atom lithography".Chinese Optics Letters 2.4(2004):187-189.
Files in This Item:
File Name/Size DocType Version Access License
4033.pdf(119KB) 开放获取CC BY-NC-NDView Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Xianzhong Chen]'s Articles
[Hanmin Yao]'s Articles
[Xunan Chen]'s Articles
Baidu academic
Similar articles in Baidu academic
[Xianzhong Chen]'s Articles
[Hanmin Yao]'s Articles
[Xunan Chen]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Xianzhong Chen]'s Articles
[Hanmin Yao]'s Articles
[Xunan Chen]'s Articles
Terms of Use
No data!
Social Bookmark/Share
File name: 4033.pdf
Format: Adobe PDF
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.