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Positioning control system of three-dimensional wafer stage of lithography
Tian, Peng1,2; Yan, Wei1,2; Yang, Fan1,2; Li, Fanxing1,2; Hu, Song1,2
2016
Source PublicationProceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
ISSN0277-786X
Volume9685Pages:96850T
SubtypeC
AbstractThree-dimensional wafer stage is an important component of lithography. It is required to high positioning precision and efficiency. The closed-loop positioning control system, that consists of five-phase step motor and grating scale, implements rapid and precision positioning control of the three-dimensional wafer stage. The MCU STC15W4K32S4, which is possession of six independent PWM output channels and the pulse width, period is adjustable, is used to control the three axes. The stepper motor driver and grating scale are subdivided according to the precision of lithography, and grating scale data is transmitted to the computer for display in real time via USB communication. According to the lithography material, mask parameter, incident light intensity, it's able to calculate the speed of Z axis, and then get the value of PWM period based on the mathematical formula of speed and pulse period, finally realize high precision control. Experiments show that the positioning control system of three-dimensional wafer stage can meet the requirement of lithography, the closed-loop system is high stability and precision, strong practicability. © 2016 SPIE.
KeywordClosed Loop Systems Control Systems Lithography Manufacture Materials Testing Optical Devices Pulse Width Modulation Stepping Motors
DOI10.1117/12.2244874
Indexed BySCI ; Ei
Language英语
Funding OrganizationChinese Academy of Sciences, Institute of Optics and Electronics (IOE) ; The Chinese Optical Society (COS)
WOS IDWOS:000387429600029
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8509
Collection微电子装备总体研究室(四室)
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan
2.610209, China
3. University of Chinese Academy of Sciences, Beijing
4.100049, China
Recommended Citation
GB/T 7714
Tian, Peng,Yan, Wei,Yang, Fan,et al. Positioning control system of three-dimensional wafer stage of lithography[J]. Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials,2016,9685:96850T.
APA Tian, Peng,Yan, Wei,Yang, Fan,Li, Fanxing,&Hu, Song.(2016).Positioning control system of three-dimensional wafer stage of lithography.Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials,9685,96850T.
MLA Tian, Peng,et al."Positioning control system of three-dimensional wafer stage of lithography".Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials 9685(2016):96850T.
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