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A new flexible hybrid mask for contact exposure and its fabrication
Liu, Xin1; Zhang, Man1; Cao, A-Xiu1; Pang, Hui1; Wang, Jia-Zhou1; Deng, Qi-Ling1
2016
Source PublicationProceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
ISSN0277-786X
Volume9685Pages:96850Q
SubtypeC
AbstractAccording to the exposure pattern distortion in contact printing caused by the photoresist and sometimes has a rough surface with impurity particles on it, we propose a new flexible hybrid mask for contact printing. The mask consists of three layers: a flexible polymer buffer layer, a polymer structure layer of high Young's modulus, and a metal masking layer. Because the hybrid mask skillfully combines the characteristics of flexible polymer and high Young's modulus polymer, it has two advantages: high flexibility and high resolution. The flexible hybrid mask can attach closely with the photoresist under the condition of vacuum adsorption. So the fabrication of micro-nano structures with high precision and high resolution can be realized. In this paper, a new flexible hybrid mask with critical dimension of 2um was fabricated. The photoresist structure with high precision was manufactured using this mask by photolithography and it verified the feasibility of the mask for lithography. © 2016 SPIE.
KeywordElastic Moduli Fabrication Lithography Manufacture Nanostructures Optical Devices Photolithography Photoresists Polymers Printing
DOI10.1117/12.2245719
Indexed BySCI ; Ei
Language英语
Funding OrganizationChinese Academy of Sciences, Institute of Optics and Electronics (IOE) ; The Chinese Optical Society (COS)
WOS IDWOS:000387429600026
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8508
Collection微电子装备总体研究室(四室)
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu
2.610209, China
Recommended Citation
GB/T 7714
Liu, Xin,Zhang, Man,Cao, A-Xiu,et al. A new flexible hybrid mask for contact exposure and its fabrication[J]. Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials,2016,9685:96850Q.
APA Liu, Xin,Zhang, Man,Cao, A-Xiu,Pang, Hui,Wang, Jia-Zhou,&Deng, Qi-Ling.(2016).A new flexible hybrid mask for contact exposure and its fabrication.Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials,9685,96850Q.
MLA Liu, Xin,et al."A new flexible hybrid mask for contact exposure and its fabrication".Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials 9685(2016):96850Q.
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