| High-precision structure fabrication based on an etching resistance layer | |
| Zhang, Man1; Deng, Qiling1; Shi, Lifang1; Cao, Axiu1; Pang, Hui1; Liu, Xin1; Wang, Jiazhou1; Hu, Song1 | |
| Source Publication | Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
 |
| Volume | 9683Pages:96830C |
| 2016 | |
| Language | 英语 |
| ISSN | 0277-786X |
| DOI | 10.1117/12.2245685 |
| Indexed By | SCI ; Ei |
| WOS ID | WOS:000387745800011 |
| Subtype | C |
| Abstract | The high-precision fabrication of micro-/nano-structure is a challenge. In this paper, we proposed a new fabrication method of high-precision structure based on an etching resistance layer. The high-precision features were fabricated by photolithography technique, followed by the etching process to transfer the features to the substrate. During this process, the etching uniformity and error lead to the feature distortion. We introduced an etching resistance layer between feature layer and substrate. The etching process will stop when arriving at the resistance layer. Due to the high precision of the plating film, the high-precision structure depth was achieved. In our experiment, we introduced aluminum trioxide as the etching resistance layer. The structures with low depth error of less than 5% were fabricated. © 2016 SPIE. |
| Keyword | Fabrication Manufacture Photolithography |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/8503 |
| Collection | 微电子装备总体研究室（四室） |
| Affiliation | 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 2.610209, China |
| Recommended Citation GB/T 7714 | Zhang, Man,Deng, Qiling,Shi, Lifang,et al. High-precision structure fabrication based on an etching resistance layer[J]. Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies,2016,9683:96830C. |
| APA | Zhang, Man.,Deng, Qiling.,Shi, Lifang.,Cao, Axiu.,Pang, Hui.,...&Hu, Song.(2016).High-precision structure fabrication based on an etching resistance layer.Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies,9683,96830C. |
| MLA | Zhang, Man,et al."High-precision structure fabrication based on an etching resistance layer".Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies 9683(2016):96830C. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2016-2097.pdf（2732KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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