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High-precision structure fabrication based on an etching resistance layer
Zhang, Man1; Deng, Qiling1; Shi, Lifang1; Cao, Axiu1; Pang, Hui1; Liu, Xin1; Wang, Jiazhou1; Hu, Song1
2016
发表期刊Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
ISSN0277-786X
卷号9683页码:96830C
文章类型C
摘要The high-precision fabrication of micro-/nano-structure is a challenge. In this paper, we proposed a new fabrication method of high-precision structure based on an etching resistance layer. The high-precision features were fabricated by photolithography technique, followed by the etching process to transfer the features to the substrate. During this process, the etching uniformity and error lead to the feature distortion. We introduced an etching resistance layer between feature layer and substrate. The etching process will stop when arriving at the resistance layer. Due to the high precision of the plating film, the high-precision structure depth was achieved. In our experiment, we introduced aluminum trioxide as the etching resistance layer. The structures with low depth error of less than 5% were fabricated. © 2016 SPIE.
关键词Fabrication Manufacture Photolithography
DOI10.1117/12.2245685
收录类别SCI ; Ei
语种英语
项目资助者Chinese Academy of Sciences, Institute of Optics and Electronics (IOE) ; The Chinese Optical Society (COS)
WOS记录号WOS:000387745800011
引用统计
文献类型期刊论文
条目标识符http://ir.ioe.ac.cn/handle/181551/8503
专题微电子装备总体研究室(四室)
作者单位1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu
2.610209, China
推荐引用方式
GB/T 7714
Zhang, Man,Deng, Qiling,Shi, Lifang,et al. High-precision structure fabrication based on an etching resistance layer[J]. Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies,2016,9683:96830C.
APA Zhang, Man.,Deng, Qiling.,Shi, Lifang.,Cao, Axiu.,Pang, Hui.,...&Hu, Song.(2016).High-precision structure fabrication based on an etching resistance layer.Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies,9683,96830C.
MLA Zhang, Man,et al."High-precision structure fabrication based on an etching resistance layer".Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies 9683(2016):96830C.
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