IOE OpenIR  > 微电子装备总体研究室(四室)
High-precision structure fabrication based on an etching resistance layer
Zhang, Man1; Deng, Qiling1; Shi, Lifang1; Cao, Axiu1; Pang, Hui1; Liu, Xin1; Wang, Jiazhou1; Hu, Song1
Source PublicationProceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Volume9683Pages:96830C
2016
Language英语
ISSN0277-786X
DOI10.1117/12.2245685
Indexed BySCI ; Ei
WOS IDWOS:000387745800011
SubtypeC
AbstractThe high-precision fabrication of micro-/nano-structure is a challenge. In this paper, we proposed a new fabrication method of high-precision structure based on an etching resistance layer. The high-precision features were fabricated by photolithography technique, followed by the etching process to transfer the features to the substrate. During this process, the etching uniformity and error lead to the feature distortion. We introduced an etching resistance layer between feature layer and substrate. The etching process will stop when arriving at the resistance layer. Due to the high precision of the plating film, the high-precision structure depth was achieved. In our experiment, we introduced aluminum trioxide as the etching resistance layer. The structures with low depth error of less than 5% were fabricated. © 2016 SPIE.
KeywordFabrication Manufacture Photolithography
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8503
Collection微电子装备总体研究室(四室)
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu
2.610209, China
Recommended Citation
GB/T 7714
Zhang, Man,Deng, Qiling,Shi, Lifang,et al. High-precision structure fabrication based on an etching resistance layer[J]. Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies,2016,9683:96830C.
APA Zhang, Man.,Deng, Qiling.,Shi, Lifang.,Cao, Axiu.,Pang, Hui.,...&Hu, Song.(2016).High-precision structure fabrication based on an etching resistance layer.Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies,9683,96830C.
MLA Zhang, Man,et al."High-precision structure fabrication based on an etching resistance layer".Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies 9683(2016):96830C.
Files in This Item:
File Name/Size DocType Version Access License
2016-2097.pdf(2732KB)期刊论文作者接受稿开放获取CC BY-NC-SAApplication Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Zhang, Man]'s Articles
[Deng, Qiling]'s Articles
[Shi, Lifang]'s Articles
Baidu academic
Similar articles in Baidu academic
[Zhang, Man]'s Articles
[Deng, Qiling]'s Articles
[Shi, Lifang]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Zhang, Man]'s Articles
[Deng, Qiling]'s Articles
[Shi, Lifang]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.