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The Anomaly of Periodicity Doubling in Projection Photolithography of Periodic Features
Liu, Junbo1,2; Zhou, Shaolin3; Yang, Yong2; Hu, Song4; He, Yu4; Chen, Yinghong5
2016
发表期刊IEEE Photonics Technology Letters
ISSN1041-1135
卷号28期号:22页码:2529-2532
文章类型J
摘要In the case of duplicating periodic features by UV projection lithography, the unwanted phenomenon of periodicity or frequency doubling somehow occurs due to far-field imaging of the near-field diffraction. In this letter, we fundamentally explored the mechanism of frequency or periodicity doubling in an analytical and numerical way, and reconfirm the validity by experiments of projection lithography. In this process, both the Talbot self-image and π-phase-shifted image were synchronously captured to generate the overlapped pattern with doubled periodicity within the depth-of-focus (DOF) area. The Fresnel diffraction theory was used to further derive the relationship between the mask and the objective lens' parameters (i.e., the resolution and DOF). Finally, experimental results showed the self-image and π-phase-shifted image, both clearly recorded on wafer when optical parameters were well adjusted. © 1989-2012 IEEE.
关键词Diffraction Frequency Doublers Light Polarization Phase Shift
DOI10.1109/LPT.2016.2602334
收录类别SCI ; Ei
语种英语
项目资助者National Natural Science Foundation of China [61204114, 6274108, 61376110, 61405060] ; science and technology planning project of Guangdong Province [2014A010104005] ; Fundamental Research Funds for the Central Universities of South China University of Technology [2015 ZZ030] ; Opening Project of State Key Laboratory of Polymer Materials Engineering (Sichuan University) [Sklpeme2015-4-28]
WOS记录号WOS:000388107000014
引用统计
文献类型期刊论文
条目标识符http://ir.ioe.ac.cn/handle/181551/8497
专题微电子装备总体研究室(四室)
作者单位1. University of Chinese Academy of Sciences, Beijing
2.100049, China
3. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu
4.610209, China
5. School of Electronic and Information Engineering, South China University of Technology, Guangzhou
6.510640, China
7. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu
8.610209, China
9. State Key Laboratory of Polymer Materials Engineering, Chengdu
10.610065, China
推荐引用方式
GB/T 7714
Liu, Junbo,Zhou, Shaolin,Yang, Yong,et al. The Anomaly of Periodicity Doubling in Projection Photolithography of Periodic Features[J]. IEEE Photonics Technology Letters,2016,28(22):2529-2532.
APA Liu, Junbo,Zhou, Shaolin,Yang, Yong,Hu, Song,He, Yu,&Chen, Yinghong.(2016).The Anomaly of Periodicity Doubling in Projection Photolithography of Periodic Features.IEEE Photonics Technology Letters,28(22),2529-2532.
MLA Liu, Junbo,et al."The Anomaly of Periodicity Doubling in Projection Photolithography of Periodic Features".IEEE Photonics Technology Letters 28.22(2016):2529-2532.
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