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The Anomaly of Periodicity Doubling in Projection Photolithography of Periodic Features
Liu, Junbo1,2; Zhou, Shaolin3; Yang, Yong2; Hu, Song4; He, Yu4; Chen, Yinghong5
Source PublicationIEEE Photonics Technology Letters
Volume28Issue:22Pages:2529-2532
2016
Language英语
ISSN1041-1135
DOI10.1109/LPT.2016.2602334
Indexed BySCI ; Ei
WOS IDWOS:000388107000014
SubtypeJ
AbstractIn the case of duplicating periodic features by UV projection lithography, the unwanted phenomenon of periodicity or frequency doubling somehow occurs due to far-field imaging of the near-field diffraction. In this letter, we fundamentally explored the mechanism of frequency or periodicity doubling in an analytical and numerical way, and reconfirm the validity by experiments of projection lithography. In this process, both the Talbot self-image and π-phase-shifted image were synchronously captured to generate the overlapped pattern with doubled periodicity within the depth-of-focus (DOF) area. The Fresnel diffraction theory was used to further derive the relationship between the mask and the objective lens' parameters (i.e., the resolution and DOF). Finally, experimental results showed the self-image and π-phase-shifted image, both clearly recorded on wafer when optical parameters were well adjusted. © 1989-2012 IEEE.
KeywordDiffraction Frequency Doublers Light Polarization Phase Shift
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8497
Collection微电子装备总体研究室(四室)
Affiliation1. University of Chinese Academy of Sciences, Beijing
2.100049, China
3. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu
4.610209, China
5. School of Electronic and Information Engineering, South China University of Technology, Guangzhou
6.510640, China
7. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu
8.610209, China
9. State Key Laboratory of Polymer Materials Engineering, Chengdu
10.610065, China
Recommended Citation
GB/T 7714
Liu, Junbo,Zhou, Shaolin,Yang, Yong,et al. The Anomaly of Periodicity Doubling in Projection Photolithography of Periodic Features[J]. IEEE Photonics Technology Letters,2016,28(22):2529-2532.
APA Liu, Junbo,Zhou, Shaolin,Yang, Yong,Hu, Song,He, Yu,&Chen, Yinghong.(2016).The Anomaly of Periodicity Doubling in Projection Photolithography of Periodic Features.IEEE Photonics Technology Letters,28(22),2529-2532.
MLA Liu, Junbo,et al."The Anomaly of Periodicity Doubling in Projection Photolithography of Periodic Features".IEEE Photonics Technology Letters 28.22(2016):2529-2532.
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