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Nano-Focusing and Leveling System Based on Improved Phase Analysis
Tang, Yan; He, Yu; Yang, Yong; Wang, Jian; Liu, Junbo; Yan, Wei
2016
Source PublicationIEEE Photonics Journal
ISSN1943-0655
Volume8Issue:2Pages:7445932
SubtypeJ
AbstractA nano-focusing and leveling system (FLS) based on improved phase analysis is proposed to measure the wafer height in lithography. Different from traditional methods, this paper applies a grating-based mark to conduct the measurement according to the principle of the Moiré effect. The phase analysis is also improved based on the fringe frequency feature, which is quantitatively analyzed for the first time. As a result, the wafer height can be measured with nanoscale precision. Compared with the existing FLS, the proposed method can get higher precision. Both the simulations and experiments are carried out to verify the feasibility and accuracy of the proposed method. © 2009-2012 IEEE.
KeywordMolecular Physics Photonics
DOI10.1109/JPHOT.2016.2544543
Indexed BySCI ; Ei
Language英语
Funding OrganizationNational Natural Science Foundation of China [61204114, 61274108] ; China Postdoctoral Science Foundation [2015M572473]
WOS IDWOS:000388089100043
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8496
Collection微电子装备总体研究室(四室)
Affiliation State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
Recommended Citation
GB/T 7714
Tang, Yan,He, Yu,Yang, Yong,et al. Nano-Focusing and Leveling System Based on Improved Phase Analysis[J]. IEEE Photonics Journal,2016,8(2):7445932.
APA Tang, Yan,He, Yu,Yang, Yong,Wang, Jian,Liu, Junbo,&Yan, Wei.(2016).Nano-Focusing and Leveling System Based on Improved Phase Analysis.IEEE Photonics Journal,8(2),7445932.
MLA Tang, Yan,et al."Nano-Focusing and Leveling System Based on Improved Phase Analysis".IEEE Photonics Journal 8.2(2016):7445932.
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