Nano-Focusing and Leveling System Based on Improved Phase Analysis | |
Tang, Yan; He, Yu; Yang, Yong; Wang, Jian; Liu, Junbo; Yan, Wei | |
Source Publication | IEEE Photonics Journal
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Volume | 8Issue:2Pages:7445932 |
2016 | |
Language | 英语 |
ISSN | 1943-0655 |
DOI | 10.1109/JPHOT.2016.2544543 |
Indexed By | SCI ; Ei |
WOS ID | WOS:000388089100043 |
Subtype | J |
Abstract | A nano-focusing and leveling system (FLS) based on improved phase analysis is proposed to measure the wafer height in lithography. Different from traditional methods, this paper applies a grating-based mark to conduct the measurement according to the principle of the Moiré effect. The phase analysis is also improved based on the fringe frequency feature, which is quantitatively analyzed for the first time. As a result, the wafer height can be measured with nanoscale precision. Compared with the existing FLS, the proposed method can get higher precision. Both the simulations and experiments are carried out to verify the feasibility and accuracy of the proposed method. © 2009-2012 IEEE. |
Keyword | Molecular Physics Photonics |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.ioe.ac.cn/handle/181551/8496 |
Collection | 微电子装备总体研究室(四室) |
Affiliation | State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China |
Recommended Citation GB/T 7714 | Tang, Yan,He, Yu,Yang, Yong,et al. Nano-Focusing and Leveling System Based on Improved Phase Analysis[J]. IEEE Photonics Journal,2016,8(2):7445932. |
APA | Tang, Yan,He, Yu,Yang, Yong,Wang, Jian,Liu, Junbo,&Yan, Wei.(2016).Nano-Focusing and Leveling System Based on Improved Phase Analysis.IEEE Photonics Journal,8(2),7445932. |
MLA | Tang, Yan,et al."Nano-Focusing and Leveling System Based on Improved Phase Analysis".IEEE Photonics Journal 8.2(2016):7445932. |
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2016-2041.pdf(603KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text |
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