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Nano-Focusing and Leveling System Based on Improved Phase Analysis
Tang, Yan; He, Yu; Yang, Yong; Wang, Jian; Liu, Junbo; Yan, Wei
Source PublicationIEEE Photonics Journal
AbstractA nano-focusing and leveling system (FLS) based on improved phase analysis is proposed to measure the wafer height in lithography. Different from traditional methods, this paper applies a grating-based mark to conduct the measurement according to the principle of the Moiré effect. The phase analysis is also improved based on the fringe frequency feature, which is quantitatively analyzed for the first time. As a result, the wafer height can be measured with nanoscale precision. Compared with the existing FLS, the proposed method can get higher precision. Both the simulations and experiments are carried out to verify the feasibility and accuracy of the proposed method. © 2009-2012 IEEE.
KeywordMolecular Physics Photonics
Indexed BySCI ; Ei
Funding OrganizationNational Natural Science Foundation of China [61204114, 61274108] ; China Postdoctoral Science Foundation [2015M572473]
WOS IDWOS:000388089100043
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Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Affiliation State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
Recommended Citation
GB/T 7714
Tang, Yan,He, Yu,Yang, Yong,et al. Nano-Focusing and Leveling System Based on Improved Phase Analysis[J]. IEEE Photonics Journal,2016,8(2):7445932.
APA Tang, Yan,He, Yu,Yang, Yong,Wang, Jian,Liu, Junbo,&Yan, Wei.(2016).Nano-Focusing and Leveling System Based on Improved Phase Analysis.IEEE Photonics Journal,8(2),7445932.
MLA Tang, Yan,et al."Nano-Focusing and Leveling System Based on Improved Phase Analysis".IEEE Photonics Journal 8.2(2016):7445932.
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