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Nano-Focusing and Leveling System Based on Improved Phase Analysis
Tang, Yan; He, Yu; Yang, Yong; Wang, Jian; Liu, Junbo; Yan, Wei
2016
发表期刊IEEE Photonics Journal
ISSN1943-0655
卷号8期号:2页码:7445932
文章类型J
摘要A nano-focusing and leveling system (FLS) based on improved phase analysis is proposed to measure the wafer height in lithography. Different from traditional methods, this paper applies a grating-based mark to conduct the measurement according to the principle of the Moiré effect. The phase analysis is also improved based on the fringe frequency feature, which is quantitatively analyzed for the first time. As a result, the wafer height can be measured with nanoscale precision. Compared with the existing FLS, the proposed method can get higher precision. Both the simulations and experiments are carried out to verify the feasibility and accuracy of the proposed method. © 2009-2012 IEEE.
关键词Molecular Physics Photonics
DOI10.1109/JPHOT.2016.2544543
收录类别SCI ; Ei
语种英语
项目资助者National Natural Science Foundation of China [61204114, 61274108] ; China Postdoctoral Science Foundation [2015M572473]
WOS记录号WOS:000388089100043
引用统计
被引频次:1[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ioe.ac.cn/handle/181551/8496
专题微电子装备总体研究室(四室)
作者单位 State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
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GB/T 7714
Tang, Yan,He, Yu,Yang, Yong,et al. Nano-Focusing and Leveling System Based on Improved Phase Analysis[J]. IEEE Photonics Journal,2016,8(2):7445932.
APA Tang, Yan,He, Yu,Yang, Yong,Wang, Jian,Liu, Junbo,&Yan, Wei.(2016).Nano-Focusing and Leveling System Based on Improved Phase Analysis.IEEE Photonics Journal,8(2),7445932.
MLA Tang, Yan,et al."Nano-Focusing and Leveling System Based on Improved Phase Analysis".IEEE Photonics Journal 8.2(2016):7445932.
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