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Superresolution nanolithography technique based on polydimethylsiloxane soft mold
He, Chuanwang1,2; Dong, Xiaochun1; Wang, Pinghe2
2016
发表期刊IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO)
ISSN2373-5422
页码269-272
文章类型C
摘要We report the design, analysis, and simulation of the superresolution nanolithography technique based on PDMS soft mold, which obtained the feature size smaller than 1/10 operating wavelength. The proposed nanolithography system consist of a periodic PDMS soft transparent mold, a thin silver layer, photoresist and substrate. The reason why we employ the PDMS soft mold is it can contact perfectly with silver layer. By adjusting the linewidth and the thickness of the silver layer, the optimal contrast were obtained. To analysis the superresolution nanolithography of proposed system, the electric field distributions and electric field intensity are given. © 2016 IEEE.
关键词Electric Fields Linewidth Manufacture Microchannels Molds Nanolithography Nanotechnology Optical Resolving Power Photoresists Pulse Width Modulation Silver
DOI10.1109/3M-NANO.2016.7824990
收录类别SCI ; Ei
语种英语
项目资助者National Natural Science Foundation of China [61007024, 61475159, 61271150]
WOS记录号WOS:000393187700052
引用统计
文献类型期刊论文
条目标识符http://ir.ioe.ac.cn/handle/181551/8495
专题微电子装备总体研究室(四室)
作者单位1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu
2.610209, China
3. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu
4.610054, China
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He, Chuanwang,Dong, Xiaochun,Wang, Pinghe. Superresolution nanolithography technique based on polydimethylsiloxane soft mold[J]. IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO),2016:269-272.
APA He, Chuanwang,Dong, Xiaochun,&Wang, Pinghe.(2016).Superresolution nanolithography technique based on polydimethylsiloxane soft mold.IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO),269-272.
MLA He, Chuanwang,et al."Superresolution nanolithography technique based on polydimethylsiloxane soft mold".IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO) (2016):269-272.
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