| Superresolution nanolithography technique based on polydimethylsiloxane soft mold | |
| He, Chuanwang1,2; Dong, Xiaochun1; Wang, Pinghe2 | |
| Source Publication | IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO)
 |
| Pages | 269-272 |
| 2016 | |
| Language | 英语 |
| ISSN | 2373-5422 |
| DOI | 10.1109/3M-NANO.2016.7824990 |
| Indexed By | SCI ; Ei |
| WOS ID | WOS:000393187700052 |
| Subtype | C |
| Abstract | We report the design, analysis, and simulation of the superresolution nanolithography technique based on PDMS soft mold, which obtained the feature size smaller than 1/10 operating wavelength. The proposed nanolithography system consist of a periodic PDMS soft transparent mold, a thin silver layer, photoresist and substrate. The reason why we employ the PDMS soft mold is it can contact perfectly with silver layer. By adjusting the linewidth and the thickness of the silver layer, the optimal contrast were obtained. To analysis the superresolution nanolithography of proposed system, the electric field distributions and electric field intensity are given. © 2016 IEEE. |
| Keyword | Electric Fields Linewidth Manufacture Microchannels Molds Nanolithography Nanotechnology Optical Resolving Power Photoresists Pulse Width Modulation Silver |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/8495 |
| Collection | 微电子装备总体研究室（四室） |
| Affiliation | 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 2.610209, China 3. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 4.610054, China |
| Recommended Citation GB/T 7714 | He, Chuanwang,Dong, Xiaochun,Wang, Pinghe. Superresolution nanolithography technique based on polydimethylsiloxane soft mold[J]. IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO),2016:269-272. |
| APA | He, Chuanwang,Dong, Xiaochun,&Wang, Pinghe.(2016).Superresolution nanolithography technique based on polydimethylsiloxane soft mold.IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO),269-272. |
| MLA | He, Chuanwang,et al."Superresolution nanolithography technique based on polydimethylsiloxane soft mold".IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO) (2016):269-272. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2016-2037.pdf（415KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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