| Superresolution nanolithography technique based on polydimethylsiloxane soft mold | |
| He, Chuanwang1,2; Dong, Xiaochun1; Wang, Pinghe2 | |
| 2016 | |
| 发表期刊 | IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO)
 |
| ISSN | 2373-5422 |
| 页码 | 269-272 |
| 文章类型 | C |
| 摘要 | We report the design, analysis, and simulation of the superresolution nanolithography technique based on PDMS soft mold, which obtained the feature size smaller than 1/10 operating wavelength. The proposed nanolithography system consist of a periodic PDMS soft transparent mold, a thin silver layer, photoresist and substrate. The reason why we employ the PDMS soft mold is it can contact perfectly with silver layer. By adjusting the linewidth and the thickness of the silver layer, the optimal contrast were obtained. To analysis the superresolution nanolithography of proposed system, the electric field distributions and electric field intensity are given. © 2016 IEEE. |
| 关键词 | Electric Fields Linewidth Manufacture Microchannels Molds Nanolithography Nanotechnology Optical Resolving Power Photoresists Pulse Width Modulation Silver |
| DOI | 10.1109/3M-NANO.2016.7824990 |
| 收录类别 | SCI ; Ei |
| 语种 | 英语 |
| 项目资助者 | National Natural Science Foundation of China [61007024, 61475159, 61271150] |
| WOS记录号 | WOS:000393187700052 |
| 引用统计 | |
| 文献类型 | 期刊论文 |
| 条目标识符 | http://ir.ioe.ac.cn/handle/181551/8495 |
| 专题 | 微电子装备总体研究室（四室） |
| 作者单位 | 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 2.610209, China 3. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 4.610054, China |
| 推荐引用方式 GB/T 7714 | He, Chuanwang,Dong, Xiaochun,Wang, Pinghe. Superresolution nanolithography technique based on polydimethylsiloxane soft mold[J]. IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO),2016:269-272. |
| APA | He, Chuanwang,Dong, Xiaochun,&Wang, Pinghe.(2016).Superresolution nanolithography technique based on polydimethylsiloxane soft mold.IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO),269-272. |
| MLA | He, Chuanwang,et al."Superresolution nanolithography technique based on polydimethylsiloxane soft mold".IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO) (2016):269-272. |
| 条目包含的文件 | ||||||
| 文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
| 2016-2037.pdf（415KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | 请求全文 | |
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。
修改评论