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Superresolution nanolithography technique based on polydimethylsiloxane soft mold
He, Chuanwang1,2; Dong, Xiaochun1; Wang, Pinghe2
Source PublicationIEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO)
Pages269-272
2016
Language英语
ISSN2373-5422
DOI10.1109/3M-NANO.2016.7824990
SubtypeC
AbstractWe report the design, analysis, and simulation of the superresolution nanolithography technique based on PDMS soft mold, which obtained the feature size smaller than 1/10 operating wavelength. The proposed nanolithography system consist of a periodic PDMS soft transparent mold, a thin silver layer, photoresist and substrate. The reason why we employ the PDMS soft mold is it can contact perfectly with silver layer. By adjusting the linewidth and the thickness of the silver layer, the optimal contrast were obtained. To analysis the superresolution nanolithography of proposed system, the electric field distributions and electric field intensity are given. © 2016 IEEE.
KeywordElectric Fields Linewidth Manufacture Microchannels Molds Nanolithography Nanotechnology Optical Resolving Power Photoresists Pulse Width Modulation Silver
Indexed BySCI ; Ei
WOS IDWOS:000393187700052
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8495
Collection微电子装备总体研究室(四室)
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu
2.610209, China
3. School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu
4.610054, China
Recommended Citation
GB/T 7714
He, Chuanwang,Dong, Xiaochun,Wang, Pinghe. Superresolution nanolithography technique based on polydimethylsiloxane soft mold[J]. IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO),2016:269-272.
APA He, Chuanwang,Dong, Xiaochun,&Wang, Pinghe.(2016).Superresolution nanolithography technique based on polydimethylsiloxane soft mold.IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO),269-272.
MLA He, Chuanwang,et al."Superresolution nanolithography technique based on polydimethylsiloxane soft mold".IEEE International Conference: 2016 6th IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (IEEE 3M-NANO) (2016):269-272.
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