| Sub-diffraction demagnification imaging lithography by hyperlens with plasmonic reflector layer | |
| Liu, Ling1; Liu, Kaipeng1; Zhao, Zeyu1; Wang, Changtao1; Gao, Ping1; Luo, Xiangang1 | |
| 2016 | |
| Source Publication | RSC Advances
 |
| ISSN | 2046-2069 |
| Volume | 6Issue:98Pages:95973-95978 |
| Subtype | J |
| Abstract | In recent years, hyperlens technology has attracted more attention because of its function of magnification and demagnification. In this study, hyperlens demagnification imaging lithography was experimentally demonstrated with sub-diffraction resolution of about 55 nm line width and about 1.8 demagnification factor at 365 nm. The hyperlens was composed of multiple Ag/SiO2films and combined with a resist layer and a plasmonic Ag reflector. It was employed to project mask patterns to subwavelength images for nanolithography. It was found that the plasmonic reflector contributes remarkably to improving imaging contrast, fidelity and efficiency by inhibiting the negative influences from the radial electric field components in the resist region. Furthermore, discussions about imaging influences with geometrical parameters are also presented. © 2016 The Royal Society of Chemistry. |
| Keyword | Diffraction Electric Field Effects Electric Fields Geometry Masks Plasmons Reflection Silver |
| DOI | 10.1039/c6ra17098f |
| Indexed By | SCI ; Ei |
| Language | 英语 |
| Funding Organization | 973 Program of China [2013CBA01700] ; Chinese Nature Science Grant [61138002, 61307013] |
| WOS ID | WOS:000385633100073 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/8478 |
| Collection | 微细加工光学技术国家重点实验室（开放室） |
| Affiliation | 1. State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 2.610209, China |
| Recommended Citation GB/T 7714 | Liu, Ling,Liu, Kaipeng,Zhao, Zeyu,et al. Sub-diffraction demagnification imaging lithography by hyperlens with plasmonic reflector layer[J]. RSC Advances,2016,6(98):95973-95978. |
| APA | Liu, Ling,Liu, Kaipeng,Zhao, Zeyu,Wang, Changtao,Gao, Ping,&Luo, Xiangang.(2016).Sub-diffraction demagnification imaging lithography by hyperlens with plasmonic reflector layer.RSC Advances,6(98),95973-95978. |
| MLA | Liu, Ling,et al."Sub-diffraction demagnification imaging lithography by hyperlens with plasmonic reflector layer".RSC Advances 6.98(2016):95973-95978. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2016-2192.pdf（1410KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | Application Full Text | |
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