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Applying Q-Type aspheres in the ultraviolet lithography objective lens
Bai, Yu1,2,3; Xing, Tingwen1; Jiang, Yadong2
2016
发表期刊Proceedings of SPIE: Novel Optical Systems Design and Optimization XIX
ISSN0277-786X
卷号9948页码:994804
文章类型C
摘要Ultraviolet lithography is the most important technology for the semiconductor manufacturer. The high resolution lithography objective lens is the key component of ultraviolet lithography.Aspheres are becoming more and more popular in optical design of lens systems.For traditional aspheres, non-zero terms of over 10th order are seldom used by optical designers.In the paper,we proposes a ultraviolet lithography objective lens with Q-Type aspheres.The working wavelength is 193.368 nm, numerical aperture is 0.75,reduction ratio is 0.25, the thickness from the first lens to object is 60mm,the thickness from the last lens to image is 8.5mm,the total track length (from object to image) is 1186mm and image field of view is 26mm×10.5mm.The optical material in ultraviolet wave band is very few,only silica and CaF2can be used in engineering project.Because CaF2material is very expensive in cost,so we choose silica as the material of ultraviolet lithography objective lens. The ultraviolet lithography objective lens is consisted of twenty-Three glass,the maximal aperture is 136.5mm eight aspheric surfaces are used to correct the off axis aberration and higher order aberration.We use the Q-Type aspheres and traditional aspheres in the ultraviolet lithography objective lens,and compare the design results. © COPYRIGHT 2016 SPIE.
关键词Cost Engineering Lenses Lithography Metal Drawing Optical Design Optical Instrument Lenses Silica Systems Analysis
DOI10.1117/12.2235896
收录类别SCI ; Ei
语种英语
项目资助者The Society of Photo-Optical Instrumentation Engineers (SPIE)
WOS记录号WOS:000389774400004
引用统计
文献类型期刊论文
条目标识符http://ir.ioe.ac.cn/handle/181551/8466
专题应用光学研究室(二室)
作者单位1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu
2.610209, China
3. University of Electronic Science and Technology of China, Chengdu
4.610054, China
5. University of Chinese Academy of Sciences, Beijing
6.100049, China
推荐引用方式
GB/T 7714
Bai, Yu,Xing, Tingwen,Jiang, Yadong. Applying Q-Type aspheres in the ultraviolet lithography objective lens[J]. Proceedings of SPIE: Novel Optical Systems Design and Optimization XIX,2016,9948:994804.
APA Bai, Yu,Xing, Tingwen,&Jiang, Yadong.(2016).Applying Q-Type aspheres in the ultraviolet lithography objective lens.Proceedings of SPIE: Novel Optical Systems Design and Optimization XIX,9948,994804.
MLA Bai, Yu,et al."Applying Q-Type aspheres in the ultraviolet lithography objective lens".Proceedings of SPIE: Novel Optical Systems Design and Optimization XIX 9948(2016):994804.
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