IOE OpenIR  > 应用光学研究室(二室)
Applying Q-Type aspheres in the ultraviolet lithography objective lens
Bai, Yu1,2,3; Xing, Tingwen1; Jiang, Yadong2
2016
Source PublicationProceedings of SPIE: Novel Optical Systems Design and Optimization XIX
ISSN0277-786X
Volume9948Pages:994804
SubtypeC
AbstractUltraviolet lithography is the most important technology for the semiconductor manufacturer. The high resolution lithography objective lens is the key component of ultraviolet lithography.Aspheres are becoming more and more popular in optical design of lens systems.For traditional aspheres, non-zero terms of over 10th order are seldom used by optical designers.In the paper,we proposes a ultraviolet lithography objective lens with Q-Type aspheres.The working wavelength is 193.368 nm, numerical aperture is 0.75,reduction ratio is 0.25, the thickness from the first lens to object is 60mm,the thickness from the last lens to image is 8.5mm,the total track length (from object to image) is 1186mm and image field of view is 26mm×10.5mm.The optical material in ultraviolet wave band is very few,only silica and CaF2can be used in engineering project.Because CaF2material is very expensive in cost,so we choose silica as the material of ultraviolet lithography objective lens. The ultraviolet lithography objective lens is consisted of twenty-Three glass,the maximal aperture is 136.5mm eight aspheric surfaces are used to correct the off axis aberration and higher order aberration.We use the Q-Type aspheres and traditional aspheres in the ultraviolet lithography objective lens,and compare the design results. © COPYRIGHT 2016 SPIE.
KeywordCost Engineering Lenses Lithography Metal Drawing Optical Design Optical Instrument Lenses Silica Systems Analysis
DOI10.1117/12.2235896
Indexed BySCI ; Ei
Language英语
Funding OrganizationThe Society of Photo-Optical Instrumentation Engineers (SPIE)
WOS IDWOS:000389774400004
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8466
Collection应用光学研究室(二室)
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu
2.610209, China
3. University of Electronic Science and Technology of China, Chengdu
4.610054, China
5. University of Chinese Academy of Sciences, Beijing
6.100049, China
Recommended Citation
GB/T 7714
Bai, Yu,Xing, Tingwen,Jiang, Yadong. Applying Q-Type aspheres in the ultraviolet lithography objective lens[J]. Proceedings of SPIE: Novel Optical Systems Design and Optimization XIX,2016,9948:994804.
APA Bai, Yu,Xing, Tingwen,&Jiang, Yadong.(2016).Applying Q-Type aspheres in the ultraviolet lithography objective lens.Proceedings of SPIE: Novel Optical Systems Design and Optimization XIX,9948,994804.
MLA Bai, Yu,et al."Applying Q-Type aspheres in the ultraviolet lithography objective lens".Proceedings of SPIE: Novel Optical Systems Design and Optimization XIX 9948(2016):994804.
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