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Research on controlling middle spatial frequency error of high gradient precise aspheric by pitch tool
Wang, Jia1; Hou, Xi1; Wan, Yongjian1; Shi, Chunyan1; Zhong, Xianyun1
2016
Source PublicationProceedings of SPIE: Nanoengineering: Fabrication, Properties, Optics, and Devices XIII
ISSN0277-787X
Volume9927Pages:99270J
SubtypeC
AbstractExtreme optical fabrication projects known as EUV and X-ray optic systems, which are representative of today's advanced optical manufacturing technology level, have special requirements for the optical surface quality. In synchroton radiation (SR) beamlines, mirrors of high shape accuracy is always used in grazing incidence. In nanolithograph systems, middle spatial frequency errors always lead to small-angle scattering or flare that reduces the contrast of the image. The slope error is defined for a given horizontal length, the increase or decrease in form error at the end point relative to the starting point is measured. The quality of reflective optical elements can be described by their deviation from ideal shape at different spatial frequencies. Usually one distinguishes between the figure error, the low spatial error part ranging from aperture length to 1mm frequencies, and the mid-high spatial error part from 1mm to 1 μm and from1 μm to some 10 nm spatial frequencies, respectively. Firstly, this paper will disscuss the relationship between slope error and middle spatial frequency error, which both describe the optical surface error along with the form profile. Then, experimental researches will be conducted on a high gradient precise aspheric with pitch tool, which aim to restraining the middle spatial frequency error. © 2016 SPIE.
KeywordFabrication
DOI10.1117/12.2236800
Indexed BySCI ; Ei
Language英语
Funding OrganizationThe Society of Photo-Optical Instrumentation Engineers (SPIE)
WOS IDWOS:000390022300012
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8464
Collection超精密总体部
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu
2.610209, China
Recommended Citation
GB/T 7714
Wang, Jia,Hou, Xi,Wan, Yongjian,et al. Research on controlling middle spatial frequency error of high gradient precise aspheric by pitch tool[J]. Proceedings of SPIE: Nanoengineering: Fabrication, Properties, Optics, and Devices XIII,2016,9927:99270J.
APA Wang, Jia,Hou, Xi,Wan, Yongjian,Shi, Chunyan,&Zhong, Xianyun.(2016).Research on controlling middle spatial frequency error of high gradient precise aspheric by pitch tool.Proceedings of SPIE: Nanoengineering: Fabrication, Properties, Optics, and Devices XIII,9927,99270J.
MLA Wang, Jia,et al."Research on controlling middle spatial frequency error of high gradient precise aspheric by pitch tool".Proceedings of SPIE: Nanoengineering: Fabrication, Properties, Optics, and Devices XIII 9927(2016):99270J.
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