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Design and simulation of large field plate lithography lens
Deng, Chao1; Xing, Tingwen1; Lin, Wumei1; Zhu, Xianchang1
Source PublicationProceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
Volume9685Pages:96850V
2016
Language英语
ISSN0277-786X
DOI10.1117/12.2245717
SubtypeC
AbstractBecause industry demand for LED,LCD panel continues to increase, the high yield of micron-scale resolution lithography is increasingly prominent for manufacturers, which requires the field of lithography objective lens becomes larger. This paper designed a lithography lens with large field, whose effective image side field will reach to 132 × 132mm.Subsequently, the tolerance was analysed by simulation for the optical system. Finally, it is proved that the design meets the requirements of micron-scale resolution. © 2016 SPIE.
KeywordFits And Tolerances Lithography Manufacture Materials Testing Optical Design Optical Devices Optical Systems
Indexed BySCI ; Ei
WOS IDWOS:000387429600031
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8458
Collection超精密总体部
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan
2.610209, China
Recommended Citation
GB/T 7714
Deng, Chao,Xing, Tingwen,Lin, Wumei,et al. Design and simulation of large field plate lithography lens[J]. Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials,2016,9685:96850V.
APA Deng, Chao,Xing, Tingwen,Lin, Wumei,&Zhu, Xianchang.(2016).Design and simulation of large field plate lithography lens.Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials,9685,96850V.
MLA Deng, Chao,et al."Design and simulation of large field plate lithography lens".Proceedings of SPIE: 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials 9685(2016):96850V.
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