IOE OpenIR  > 自适应光学技术研究室(八室)
Influence of deposition parameters on residual stress of YbF3 thin film
Zhang, Yao-Ping1; Fan, Jun-Qi1; Long, Guo-Yun1
2016
发表期刊Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015
ISSN0277-786X
卷号9796页码:97960N
文章类型C
摘要YbF3was proposed as a substitute for ThF4in anti-reflection or reflection coatings for the infrared range, and the residual stress of YbF3thin film using APS plasma ion assisted deposition(PIAD) was studied. From the results, we found the anode voltage of PIAD has a large effect on the residual stress of YbF3thin film, and the refractive index of YbF3produced with PIAD was higher than without it, with a possible reason close to packing density. Finally, we produced multi-layer reflection coating on a 260mm diameter mono-crystalline silicon substrate. Its surface contour was approximately 0.240λ (λ = 632.8nm), and the absorption was lower than 200ppm, which can satisfy the practical requirement. © 2016 SPIE.
关键词Adaptive Optics Coatings Deposition Ion Beam Assisted depositIon Monocrystalline Silicon Reflective Coatings Refractive Index Residual Stresses Space Debris Sputtering
DOI10.1117/12.2228239
收录类别SCI ; Ei
语种英语
项目资助者Chinese Academy of Engineering ; Chinese Society for Optical Engineering ; National Natural Science Foundation of China
WOS记录号WOS:000374450700023
引用统计
被引频次:1[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ioe.ac.cn/handle/181551/8452
专题自适应光学技术研究室(八室)
作者单位1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China
2.The Key Laboratory on Adaptive Optics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China
推荐引用方式
GB/T 7714
Zhang, Yao-Ping,Fan, Jun-Qi,Long, Guo-Yun. Influence of deposition parameters on residual stress of YbF3 thin film[J]. Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015,2016,9796:97960N.
APA Zhang, Yao-Ping,Fan, Jun-Qi,&Long, Guo-Yun.(2016).Influence of deposition parameters on residual stress of YbF3 thin film.Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015,9796,97960N.
MLA Zhang, Yao-Ping,et al."Influence of deposition parameters on residual stress of YbF3 thin film".Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015 9796(2016):97960N.
条目包含的文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
2016-2181.pdf(539KB)期刊论文作者接受稿开放获取CC BY-NC-SA请求全文
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Zhang, Yao-Ping]的文章
[Fan, Jun-Qi]的文章
[Long, Guo-Yun]的文章
百度学术
百度学术中相似的文章
[Zhang, Yao-Ping]的文章
[Fan, Jun-Qi]的文章
[Long, Guo-Yun]的文章
必应学术
必应学术中相似的文章
[Zhang, Yao-Ping]的文章
[Fan, Jun-Qi]的文章
[Long, Guo-Yun]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。