Influence of deposition parameters on residual stress of YbF3 thin film

doi:10.1117/12.2228239

	Influence of deposition parameters on residual stress of YbF3 thin film
	Zhang, Yao-Ping 1; Fan, Jun-Qi 1; Long, Guo-Yun 1
	2016
发表期刊	Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015
ISSN	0277-786X
卷号	9796 页码:97960N
文章类型	C
摘要	YbF3was proposed as a substitute for ThF4in anti-reflection or reflection coatings for the infrared range, and the residual stress of YbF3thin film using APS plasma ion assisted deposition(PIAD) was studied. From the results, we found the anode voltage of PIAD has a large effect on the residual stress of YbF3thin film, and the refractive index of YbF3produced with PIAD was higher than without it, with a possible reason close to packing density. Finally, we produced multi-layer reflection coating on a 260mm diameter mono-crystalline silicon substrate. Its surface contour was approximately 0.240λ (λ = 632.8nm), and the absorption was lower than 200ppm, which can satisfy the practical requirement. © 2016 SPIE.
关键词	Adaptive Optics Coatings Deposition Ion Beam Assisted depositIon Monocrystalline Silicon Reflective Coatings Refractive Index Residual Stresses Space Debris Sputtering
DOI	10.1117/12.2228239
收录类别	SCI ; Ei
语种	英语
项目资助者	Chinese Academy of Engineering ; Chinese Society for Optical Engineering ; National Natural Science Foundation of China
WOS记录号	WOS:000374450700023
引用统计	被引频次：1[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.ioe.ac.cn/handle/181551/8452
专题	自适应光学技术研究室（八室）
作者单位	1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China 2.The Key Laboratory on Adaptive Optics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China
推荐引用方式 GB/T 7714	Zhang, Yao-Ping,Fan, Jun-Qi,Long, Guo-Yun. Influence of deposition parameters on residual stress of YbF3 thin film[J]. Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015,2016,9796:97960N.
APA	Zhang, Yao-Ping,Fan, Jun-Qi,&Long, Guo-Yun.(2016).Influence of deposition parameters on residual stress of YbF3 thin film.Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015,9796,97960N.
MLA	Zhang, Yao-Ping,et al."Influence of deposition parameters on residual stress of YbF3 thin film".Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015 9796(2016):97960N.

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