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Influence of deposition parameters on residual stress of YbF3 thin film
Zhang, Yao-Ping1; Fan, Jun-Qi1; Long, Guo-Yun1
Source PublicationProceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015
Volume9796Pages:97960N
2016
Language英语
ISSN0277-786X
DOI10.1117/12.2228239
Indexed BySCI ; Ei
WOS IDWOS:000374450700023
SubtypeC
AbstractYbF3was proposed as a substitute for ThF4in anti-reflection or reflection coatings for the infrared range, and the residual stress of YbF3thin film using APS plasma ion assisted deposition(PIAD) was studied. From the results, we found the anode voltage of PIAD has a large effect on the residual stress of YbF3thin film, and the refractive index of YbF3produced with PIAD was higher than without it, with a possible reason close to packing density. Finally, we produced multi-layer reflection coating on a 260mm diameter mono-crystalline silicon substrate. Its surface contour was approximately 0.240λ (λ = 632.8nm), and the absorption was lower than 200ppm, which can satisfy the practical requirement. © 2016 SPIE.
KeywordAdaptive Optics Coatings Deposition Ion Beam Assisted depositIon Monocrystalline Silicon Reflective Coatings Refractive Index Residual Stresses Space Debris Sputtering
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/8452
Collection自适应光学技术研究室(八室)
Affiliation1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China
2.The Key Laboratory on Adaptive Optics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China
Recommended Citation
GB/T 7714
Zhang, Yao-Ping,Fan, Jun-Qi,Long, Guo-Yun. Influence of deposition parameters on residual stress of YbF3 thin film[J]. Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015,2016,9796:97960N.
APA Zhang, Yao-Ping,Fan, Jun-Qi,&Long, Guo-Yun.(2016).Influence of deposition parameters on residual stress of YbF3 thin film.Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015,9796,97960N.
MLA Zhang, Yao-Ping,et al."Influence of deposition parameters on residual stress of YbF3 thin film".Proceedings of SPIE: Selected Papers of the Photoelectronic Technology Committee Conferences held November 2015 9796(2016):97960N.
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