IOE OpenIR  > 光电技术研究所博硕士论文
Thesis Advisor李展
Degree Grantor中国科学院光电技术研究所
Place of Conferral中国科学院光电技术研究所
Keyword原子光刻 驻波透镜 原子束 分辫率
Other AbstractAtom lithography is a novel micro-fabrication technique based on laser cooling and trapping of neutral atoms since 1990's. Its emergence is adapted for the integrative demand of microelectronic device. The basic principle of atom lithography is using atom standing wave lens substituting the lithography objective to fabricate nano-patterns by focus atomic beams. As consequence of the de Broglie wavelength of the thermal atomic beams than visible or ultraviolet wave, atom lithography has the potential for high resolution. Moreover, because of its parallel nature, this technique continues to retain a high throughput for lithography. However, this technique is belonging to the apply fundamental research in the world wide, and haven't yet to enter the applied industrialization step. There are many theoretical and technical problem to be studied. In this work, the standing wave atom lens for atom lithography is studied by theoretical and experimental method. Firstly, we summarized the emergence and status of atom lithography at present based on the development course of lithography technique. And then , the formation and properties of atomic beams are analyzed based on the principle of interaction between laser and atom. Specially, the construction principle, method, characteristic parameter and atomic deposition effects of standing laser wave lens are discussed. Through directly studying the dynamics of atoms in laser sanding wave in the regime of over-focused immersion lens, we find that multiple focusing appears when laser intensity is larger than that required for simple focusing. If laser intensity is much higher than that for the single focusing, a "channeling" phenomenon appears, which is insensitive to the variation of some parameters, such as focal plane Position and laser intensity. This "channeling" phenomenon is advantageous for atomic deposition in laser standing wave. In experiment, we designed and built a set of atom lithography experimental setup, which include super-high vacuum system, atomic source, single frequency laser system and the CCD microscope system for the lithography samples et al. The design outline of the above units are analyzed, and the characteristic of experiment equipment are also experimentally studied. Finally, the experimental results are present respectively.
Document Type学位论文
Recommended Citation
GB/T 7714
陈元培. 适用于原子光刻的驻波原子透镜研究[D]. 中国科学院光电技术研究所. 中国科学院光电技术研究所,2003.
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