中国科学院光电技术研究所机构知识库
Advanced  
IOE OpenIR  > 质量处(质检中心)  > 会议论文
题名:
Effect of fabrication errors on binary optical element imaging quality
作者: Wang, Song1,2; Yang, Wei1; Wu, Shi-Bin1
出版日期: 2013
会议名称: Proceedings of SPIE: International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications
会议日期: 2013
学科分类: Aberrations - Alignment - Diffraction efficiency - Etching - Fabrication - Fits and tolerances - Linewidth - Optical image storage - Optical systems - Optics - Systems analysis - Wavefronts
DOI: 10.1117/12.2034604
中文摘要: Compared to conventional optical elements, the binary optical element (BOE) can not only revise aberration, but also reduce optical system's weight, miniaturize a system and increase the freedom of system design. Nowadays, we need to improve the manufacturing process before the industrialization of the BOE. However, the fabrication accuracy of BOE affects the imaging quality of the optical system. This paper analyzes the influence of fabrication errors on BOE's diffraction efficiency and transmission wavefront, to guide the processing and tolerance analysis of the optical systems design stage. Generally, in fabrication processes of the multiple-phase step BOE, there are alignment errors, linewidth errors and depth errors for various reasons. Due to the fabrication errors, the diffraction efficiency of the BOE would be reduced, thus stray light is introduced into the system. Besides, BOE graphical structure is also changed, then introduces wavefront aberrations to the optical imaging system, and thereby reduces the imaging quality of the system. Based on scalar diffraction theory, we have come to some conclusions like that the formula of wavefront PTV which can derive the fabrication requirements of alignment accuracy and linewidth accuracy; if 4-step BOE's linewidth errors are controlled within a certain range, diffraction efficiency declines little, however, when the linewidth errors exceed this range, the diffraction efficiency will decline rapidly; the influence of deep and shallow etching depth errors on the diffraction efficiency is equivalent, the influence of multiple etching depth errors on the diffraction efficiency is independent and symmetric, and so on. This article focuses on analyzing the fabrication requirements of BOE based on how the fabrication errors affect the diffraction efficiency and wavefront imaging quality of BOE, then guide the design and fabrication processes of BOE imaging optical systems. © 2013 SPIE.
英文摘要: Compared to conventional optical elements, the binary optical element (BOE) can not only revise aberration, but also reduce optical system's weight, miniaturize a system and increase the freedom of system design. Nowadays, we need to improve the manufacturing process before the industrialization of the BOE. However, the fabrication accuracy of BOE affects the imaging quality of the optical system. This paper analyzes the influence of fabrication errors on BOE's diffraction efficiency and transmission wavefront, to guide the processing and tolerance analysis of the optical systems design stage. Generally, in fabrication processes of the multiple-phase step BOE, there are alignment errors, linewidth errors and depth errors for various reasons. Due to the fabrication errors, the diffraction efficiency of the BOE would be reduced, thus stray light is introduced into the system. Besides, BOE graphical structure is also changed, then introduces wavefront aberrations to the optical imaging system, and thereby reduces the imaging quality of the system. Based on scalar diffraction theory, we have come to some conclusions like that the formula of wavefront PTV which can derive the fabrication requirements of alignment accuracy and linewidth accuracy; if 4-step BOE's linewidth errors are controlled within a certain range, diffraction efficiency declines little, however, when the linewidth errors exceed this range, the diffraction efficiency will decline rapidly; the influence of deep and shallow etching depth errors on the diffraction efficiency is equivalent, the influence of multiple etching depth errors on the diffraction efficiency is independent and symmetric, and so on. This article focuses on analyzing the fabrication requirements of BOE based on how the fabrication errors affect the diffraction efficiency and wavefront imaging quality of BOE, then guide the design and fabrication processes of BOE imaging optical systems. © 2013 SPIE.
收录类别: Ei
语种: 英语
卷号: 8911
ISSN号: 0277786X
文章类型: 会议论文
页码: 89110O
Citation statistics:
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7918
Appears in Collections:质量处(质检中心)_会议论文

Files in This Item:
File Name/ File Size Content Type Version Access License
2013-2010.pdf(359KB)会议论文--限制开放View 联系获取全文

作者单位: 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan 610209, China
2. University of Chinese Academy of Sciences, Beijing 100039, China

Recommended Citation:
Wang, Song,Yang, Wei,Wu, Shi-Bin. Effect of fabrication errors on binary optical element imaging quality[C]. 见:Proceedings of SPIE: International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications. 2013.
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Wang, Song]'s Articles
[Yang, Wei]'s Articles
[Wu, Shi-Bin]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Wang, Song]‘s Articles
[Yang, Wei]‘s Articles
[Wu, Shi-Bin]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
文件名: 2013-2010.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Copyright © 2007-2016  中国科学院光电技术研究所 - Feedback
Powered by CSpace