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Reflective plasmonic imaging lithography with deep sub-wavelength resolution and high aspect ratio
Wang, Changtao; Gao, Ping; Zhao, Zeyu; Yao, Na; Wang, Qinyan; Luo, Xiangang; Luo, X. (lxg@ioe.ac.cn)
2014
Language英语
Indexed ByEi
Subtype会议论文
AbstractReflective silver layer is employed toimproveboth resolution andfidelity of sub-diffraction lithography by amplifying evanescent waves and tailoring electric field components. Nano characters patterns with depth~35nm and about 36nm line width are obtained. © 2014 OSA.; Reflective silver layer is employed toimproveboth resolution andfidelity of sub-diffraction lithography by amplifying evanescent waves and tailoring electric field components. Nano characters patterns with depth~35nm and about 36nm line width are obtained. © 2014 OSA.
Conference NameOptics InfoBase Conference Papers: CLEO: Science and Innovations, CLEO_SI 2014
Conference Date2014
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7898
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorLuo, X. (lxg@ioe.ac.cn)
Affiliation State Key Laboratory of Optical Technologies on Nano-Fabrication andMicro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 610209, China
Recommended Citation
GB/T 7714
Wang, Changtao,Gao, Ping,Zhao, Zeyu,et al. Reflective plasmonic imaging lithography with deep sub-wavelength resolution and high aspect ratio[C],2014.
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2014-2072.pdf(258KB)会议论文 开放获取CC BY-NC-SAApplication Full Text
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