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题名:
Reflective plasmonic imaging lithography with deep sub-wavelength resolution and high aspect ratio
作者: Wang, Changtao; Gao, Ping; Zhao, Zeyu; Yao, Na; Wang, Qinyan; Luo, Xiangang
出版日期: 2014
会议名称: Optics InfoBase Conference Papers: CLEO: Science and Innovations, CLEO_SI 2014
会议日期: 2014
学科分类: Electric fields
通讯作者: Luo, X. (lxg@ioe.ac.cn)
中文摘要: Reflective silver layer is employed toimproveboth resolution andfidelity of sub-diffraction lithography by amplifying evanescent waves and tailoring electric field components. Nano characters patterns with depth~35nm and about 36nm line width are obtained. © 2014 OSA.
英文摘要: Reflective silver layer is employed toimproveboth resolution andfidelity of sub-diffraction lithography by amplifying evanescent waves and tailoring electric field components. Nano characters patterns with depth~35nm and about 36nm line width are obtained. © 2014 OSA.
收录类别: Ei
语种: 英语
文章类型: 会议论文
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7898
Appears in Collections:微细加工光学技术国家重点实验室(开放室)_会议论文

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作者单位: State Key Laboratory of Optical Technologies on Nano-Fabrication andMicro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, P.O. Box 350, Chengdu 610209, China

Recommended Citation:
Wang, Changtao,Gao, Ping,Zhao, Zeyu,et al. Reflective plasmonic imaging lithography with deep sub-wavelength resolution and high aspect ratio[C]. 见:Optics InfoBase Conference Papers: CLEO: Science and Innovations, CLEO_SI 2014. 2014.
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文件名: 2014-2072.pdf
格式: Adobe PDF
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