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题名:
Investigation of laser-induced damage threshold of hafnia/silica high reflectors at 1064 nm
作者: Ai, Wanjun1,2; Xiong, Shengming1
出版日期: 2012
会议名称: Proceedings of SPIE: Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers
会议日期: 2012
DOI: 10.1117/12.910464
通讯作者: Ai, W. (awj422177370@163.com)
中文摘要: HfO2 single layers and HfO2/SiO2 high reflectors with standard 1/4 wavelength design were prepared by ion assisted deposition (IAD) with APS ion source and ion beam sputtering (IBS). Characterization of HfO2 single layers such as structural and optical properties, surface topography and absorption have been studied. The laser-induced damage thresholds (LIDTs) of the high reflectors with different multilayer stacks at 1064nm were tested with S-on-1 testing mode according to ISO-11254. In addition, optical properties, surface topography and absorption of these testing high reflectors have also been investigated in our experiments. All the results used to analyze the LIDTs of high reflectors have been discussed and interpreted in literature. © 2012 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).
英文摘要: HfO2 single layers and HfO2/SiO2 high reflectors with standard 1/4 wavelength design were prepared by ion assisted deposition (IAD) with APS ion source and ion beam sputtering (IBS). Characterization of HfO2 single layers such as structural and optical properties, surface topography and absorption have been studied. The laser-induced damage thresholds (LIDTs) of the high reflectors with different multilayer stacks at 1064nm were tested with S-on-1 testing mode according to ISO-11254. In addition, optical properties, surface topography and absorption of these testing high reflectors have also been investigated in our experiments. All the results used to analyze the LIDTs of high reflectors have been discussed and interpreted in literature. © 2012 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).
收录类别: Ei
语种: 英语
卷号: 8206
ISSN号: 0277786X
文章类型: 会议论文
页码: 82060G
Citation statistics:
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7858
Appears in Collections:薄膜光学技术研究室(十一室)_会议论文

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作者单位: 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. Graduate School of the Chinese Academy of Sciences, Beijing 100039, China

Recommended Citation:
Ai, Wanjun,Xiong, Shengming. Investigation of laser-induced damage threshold of hafnia/silica high reflectors at 1064 nm[C]. 见:Proceedings of SPIE: Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers. 2012.
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