| The analysis of layout and correction performance of adaptive optics system based on bimorph deformable mirror | |
| Xiao, Fei1,2,3; Zhang, Yudong1,2; Yun, Dai1,2; Hong, Zhou1,2; Xiao, F. (ustcxiaofei@163.com) | |
| Volume | 8419 |
| Pages | 84191P |
| 2012 | |
| Language | 英语 |
| ISSN | 0277786X |
| DOI | 10.1117/12.974316 |
| Indexed By | Ei |
| Subtype | 会议论文 |
| Abstract | Wavefront sensor and wavefront corrector are two important parts of adaptive optics (AO) systems, which must match well in order to achieve optimal aberration correction performance. In this paper, for a selected 35-elemenet bimorph deformable mirror, which is made by Institute of Optics and Electronics (IOE), Shack-Hartmann wavefront sensors are designed and analyzed with two different layouts, square layout and annular layout. A simulation model is established to evaluate the correction performance of the system. Within each layout, wavefront sensors with different number of subapertures are compared and analyzed. The best matching Shack-Hartmann wavefront sensor design is obtained by minimizing the condition number and wavefront correction error. The results show that higher correction performance can be achieved with square configuration and there is an optimal subaperture number for this selected deformable mirror. © 2012 SPIE.; Wavefront sensor and wavefront corrector are two important parts of adaptive optics (AO) systems, which must match well in order to achieve optimal aberration correction performance. In this paper, for a selected 35-elemenet bimorph deformable mirror, which is made by Institute of Optics and Electronics (IOE), Shack-Hartmann wavefront sensors are designed and analyzed with two different layouts, square layout and annular layout. A simulation model is established to evaluate the correction performance of the system. Within each layout, wavefront sensors with different number of subapertures are compared and analyzed. The best matching Shack-Hartmann wavefront sensor design is obtained by minimizing the condition number and wavefront correction error. The results show that higher correction performance can be achieved with square configuration and there is an optimal subaperture number for this selected deformable mirror. © 2012 SPIE. |
| Conference Name | Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing, Imaging, and Solar Energy |
| Conference Date | 2012 |
| Citation statistics | |
| Document Type | 会议论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7788 |
| Collection | 自适应光学技术研究室（八室） |
| Corresponding Author | Xiao, F. (ustcxiaofei@163.com) |
| Affiliation | 1. Laboratory on Adaptive Optics, Institute of Optics and Electronics, Chinese Academy of Science, Chengdu 610209, China 2. Key Laboratory on Adaptive Optics, Chinese Academy of Science, Chengdu 610209, China 3. Graduate School of Chinese Academy of Science, Beijing 100049, China |
| Recommended Citation GB/T 7714 | Xiao, Fei,Zhang, Yudong,Yun, Dai,et al. The analysis of layout and correction performance of adaptive optics system based on bimorph deformable mirror[C],2012:84191P. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2012-2148.pdf（412KB） | 会议论文 | 开放获取 | CC BY-NC-SA | Application Full Text | ||
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment