| 题名: | The analysis of layout and correction performance of adaptive optics system based on bimorph deformable mirror |
| 作者: | Xiao, Fei1,2,3; Zhang, Yudong1,2; Yun, Dai1,2; Hong, Zhou1,2
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| 出版日期: | 2012
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| 会议名称: | Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing, Imaging, and Solar Energy
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| 会议日期: | 2012
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| DOI: | 10.1117/12.974316
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| 通讯作者: | Xiao, F. (ustcxiaofei@163.com)
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| 中文摘要: | Wavefront sensor and wavefront corrector are two important parts of adaptive optics (AO) systems, which must match well in order to achieve optimal aberration correction performance. In this paper, for a selected 35-elemenet bimorph deformable mirror, which is made by Institute of Optics and Electronics (IOE), Shack-Hartmann wavefront sensors are designed and analyzed with two different layouts, square layout and annular layout. A simulation model is established to evaluate the correction performance of the system. Within each layout, wavefront sensors with different number of subapertures are compared and analyzed. The best matching Shack-Hartmann wavefront sensor design is obtained by minimizing the condition number and wavefront correction error. The results show that higher correction performance can be achieved with square configuration and there is an optimal subaperture number for this selected deformable mirror. © 2012 SPIE. |
| 英文摘要: | Wavefront sensor and wavefront corrector are two important parts of adaptive optics (AO) systems, which must match well in order to achieve optimal aberration correction performance. In this paper, for a selected 35-elemenet bimorph deformable mirror, which is made by Institute of Optics and Electronics (IOE), Shack-Hartmann wavefront sensors are designed and analyzed with two different layouts, square layout and annular layout. A simulation model is established to evaluate the correction performance of the system. Within each layout, wavefront sensors with different number of subapertures are compared and analyzed. The best matching Shack-Hartmann wavefront sensor design is obtained by minimizing the condition number and wavefront correction error. The results show that higher correction performance can be achieved with square configuration and there is an optimal subaperture number for this selected deformable mirror. © 2012 SPIE. |
| 收录类别: | Ei
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| 语种: | 英语
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| 卷号: | 8419
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| ISSN号: | 0277786X
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| 文章类型: | 会议论文
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| 页码: | 84191P
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| Citation statistics: |
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| 内容类型: | 会议论文
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| URI标识: | http://ir.ioe.ac.cn/handle/181551/7788
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| Appears in Collections: | 自适应光学技术研究室（八室）_会议论文
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作者单位: | 1. Laboratory on Adaptive Optics, Institute of Optics and Electronics, Chinese Academy of Science, Chengdu 610209, China
2. Key Laboratory on Adaptive Optics, Chinese Academy of Science, Chengdu 610209, China
3. Graduate School of Chinese Academy of Science, Beijing 100049, China
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| Recommended Citation: | |
Xiao, Fei,Zhang, Yudong,Yun, Dai,et al. The analysis of layout and correction performance of adaptive optics system based on bimorph deformable mirror[C]. 见:Proceedings of SPIE: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing, Imaging, and Solar Energy. 2012.
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