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Simulation of surface plasmon nanolithography using tapered structure
Xingzhan Wei; Xiaochun Dong; and ChunlEi Du
Volume7284
2009
Language英语
Indexed ByEi
Subtype会议论文
AbstractA localized surface plasmon nanolithography (LSPN) technique using tapered structure is proposed and demonstrated to produce patterns with sub-wavelength feature size. The special masks with periodic taper tips are employed to excite surface plasmon polaritons (SPPs) on the illuminated side, and the SPP waves propagate toward the tips along the taper surface, which causes most of energy accumulation at the tips and gives rise to high local field enhancement in a nearfield region around the tips. Highly efficient nanolithography with sub-50nm feature size has been demonstrated by using the FDTD simulation results at different tip widths, at the same time, the variation of tip angel has been proved to have great influence on transmission efficiency, and also affects the line width.; A localized surface plasmon nanolithography (LSPN) technique using tapered structure is proposed and demonstrated to produce patterns with sub-wavelength feature size. The special masks with periodic taper tips are employed to excite surface plasmon polaritons (SPPs) on the illuminated side, and the SPP waves propagate toward the tips along the taper surface, which causes most of energy accumulation at the tips and gives rise to high local field enhancement in a nearfield region around the tips. Highly efficient nanolithography with sub-50nm feature size has been demonstrated by using the FDTD simulation results at different tip widths, at the same time, the variation of tip angel has been proved to have great influence on transmission efficiency, and also affects the line width.
Conference NameProceedings of SPIE
Conference Date2009
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7679
Collection微电子装备总体研究室(四室微光学)
Corresponding AuthorXingzhan Wei
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Xingzhan Wei,Xiaochun Dong,and ChunlEi Du. Simulation of surface plasmon nanolithography using tapered structure[C],2009.
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