| Simulation of surface plasmon nanolithography using tapered structure | |
| Xingzhan Wei; Xiaochun Dong; and ChunlEi Du | |
| Volume | 7284 |
| 2009 | |
| Language | 英语 |
| Indexed By | Ei |
| Subtype | 会议论文 |
| Abstract | A localized surface plasmon nanolithography (LSPN) technique using tapered structure is proposed and demonstrated to produce patterns with sub-wavelength feature size. The special masks with periodic taper tips are employed to excite surface plasmon polaritons (SPPs) on the illuminated side, and the SPP waves propagate toward the tips along the taper surface, which causes most of energy accumulation at the tips and gives rise to high local field enhancement in a nearfield region around the tips. Highly efficient nanolithography with sub-50nm feature size has been demonstrated by using the FDTD simulation results at different tip widths, at the same time, the variation of tip angel has been proved to have great influence on transmission efficiency, and also affects the line width.; A localized surface plasmon nanolithography (LSPN) technique using tapered structure is proposed and demonstrated to produce patterns with sub-wavelength feature size. The special masks with periodic taper tips are employed to excite surface plasmon polaritons (SPPs) on the illuminated side, and the SPP waves propagate toward the tips along the taper surface, which causes most of energy accumulation at the tips and gives rise to high local field enhancement in a nearfield region around the tips. Highly efficient nanolithography with sub-50nm feature size has been demonstrated by using the FDTD simulation results at different tip widths, at the same time, the variation of tip angel has been proved to have great influence on transmission efficiency, and also affects the line width. |
| Conference Name | Proceedings of SPIE |
| Conference Date | 2009 |
| Document Type | 会议论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7679 |
| Collection | 微电子装备总体研究室（四室微光学） |
| Corresponding Author | Xingzhan Wei |
| Affiliation | 中国科学院光电技术研究所 |
| Recommended Citation GB/T 7714 | Xingzhan Wei,Xiaochun Dong,and ChunlEi Du. Simulation of surface plasmon nanolithography using tapered structure[C],2009. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2009-239.pdf（463KB） | 会议论文 | 开放获取 | CC BY-NC-SA | Application Full Text | ||
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