| 题名: | Simulation of surface plasmon nanolithography using tapered structure |
| 作者: | Xingzhan Wei; Xiaochun Dong; and ChunlEi Du
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| 出版日期: | 2009
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| 会议名称: | Proceedings of SPIE
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| 会议日期: | 2009
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| 通讯作者: | Xingzhan Wei
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| 中文摘要: | A localized surface plasmon nanolithography (LSPN) technique using tapered structure is proposed and demonstrated to produce patterns with sub-wavelength feature size. The special masks with periodic taper tips are employed to excite surface plasmon polaritons (SPPs) on the illuminated side, and the SPP waves propagate toward the tips along the taper surface, which causes most of energy accumulation at the tips and gives rise to high local field enhancement in a nearfield region around the tips. Highly efficient nanolithography with sub-50nm feature size has been demonstrated by using the FDTD simulation results at different tip widths, at the same time, the variation of tip angel has been proved to have great influence on transmission efficiency, and also affects the line width. |
| 英文摘要: | A localized surface plasmon nanolithography (LSPN) technique using tapered structure is proposed and demonstrated to produce patterns with sub-wavelength feature size. The special masks with periodic taper tips are employed to excite surface plasmon polaritons (SPPs) on the illuminated side, and the SPP waves propagate toward the tips along the taper surface, which causes most of energy accumulation at the tips and gives rise to high local field enhancement in a nearfield region around the tips. Highly efficient nanolithography with sub-50nm feature size has been demonstrated by using the FDTD simulation results at different tip widths, at the same time, the variation of tip angel has been proved to have great influence on transmission efficiency, and also affects the line width. |
| 收录类别: | Ei
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| 语种: | 英语
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| 卷号: | 7284
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| 文章类型: | 会议论文
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| 内容类型: | 会议论文
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| URI标识: | http://ir.ioe.ac.cn/handle/181551/7679
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| Appears in Collections: | 微电子装备总体研究室（四室微光学） _会议论文
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| 2009-239.pdf（463KB） | 会议论文 | -- | 限制开放 | | View
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| Recommended Citation: | |
Xingzhan Wei,Xiaochun Dong,and ChunlEi Du. Simulation of surface plasmon nanolithography using tapered structure[C]. 见:Proceedings of SPIE. 2009.
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