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Projection photolithography method for fabricating continuous surface structure with aperture less than 10 μm
Shi Lifang; Zhang Weiguo; Dong Xiaochun; Ye Yutang; Du Chunlei
Volume7848
Pages78480T (6 pp.)
2010
Language英语
Indexed ByEi ; ISTP
Subtype会议论文
Conference NameProceedings of the SPIE - The International Society for Optical Engineering
Conference Date2010
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7674
Collection微电子装备总体研究室(四室微光学)
Corresponding AuthorShi Lifang
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Shi Lifang,Zhang Weiguo,Dong Xiaochun,et al. Projection photolithography method for fabricating continuous surface structure with aperture less than 10 μm[C],2010:78480T (6 pp.).
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