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Nanofabrication with sub-50nm features by imprinting-induced cracks
Xia, Liangping1; Zhang, Man2; Yang, Zheng1; Yin, Shaoyun1; Du, Chunlei1
Volume9272
Pages92720K
2014
Language英语
ISSN0277786X
DOI10.1117/12.2073501
Indexed ByEi
Subtype会议论文
AbstractNanofabrication is the foundation of nanophotonics and has become a research hotspot in the last decades. The method annealing crack is proposed to transfer the nanocracks from ultraviolet (UV) resist to other photonic materials. The method is demonstrated by simulating the inner stress distribution with the thermal-structure analysis. In addition, the parameter influence to the maximum stress is discussed and the results indicate that the annealing temperature has a large effect. The method is simple, low cost, high efficiency and is a good candidate to fabricate nanophotonic structures with critical size less than 50nm. © 2014 SPIE.; Nanofabrication is the foundation of nanophotonics and has become a research hotspot in the last decades. The method annealing crack is proposed to transfer the nanocracks from ultraviolet (UV) resist to other photonic materials. The method is demonstrated by simulating the inner stress distribution with the thermal-structure analysis. In addition, the parameter influence to the maximum stress is discussed and the results indicate that the annealing temperature has a large effect. The method is simple, low cost, high efficiency and is a good candidate to fabricate nanophotonic structures with critical size less than 50nm. © 2014 SPIE.
Conference NameProceedings of SPIE: Optical Design and Testing VI
Conference Date2014
Citation statistics
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7669
Collection微电子装备总体研究室(四室)
Corresponding AuthorXia, Liangping
Affiliation1. Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing, China
2. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
Recommended Citation
GB/T 7714
Xia, Liangping,Zhang, Man,Yang, Zheng,et al. Nanofabrication with sub-50nm features by imprinting-induced cracks[C],2014:92720K.
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