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题名:
Nanofabrication with sub-50nm features by imprinting-induced cracks
作者: Xia, Liangping1; Zhang, Man2; Yang, Zheng1; Yin, Shaoyun1; Du, Chunlei1
出版日期: 2014
会议名称: Proceedings of SPIE: Optical Design and Testing VI
会议日期: 2014
学科分类: Cracks - Nanophotonics - Optical design
DOI: 10.1117/12.2073501
通讯作者: Xia, Liangping
中文摘要: Nanofabrication is the foundation of nanophotonics and has become a research hotspot in the last decades. The method annealing crack is proposed to transfer the nanocracks from ultraviolet (UV) resist to other photonic materials. The method is demonstrated by simulating the inner stress distribution with the thermal-structure analysis. In addition, the parameter influence to the maximum stress is discussed and the results indicate that the annealing temperature has a large effect. The method is simple, low cost, high efficiency and is a good candidate to fabricate nanophotonic structures with critical size less than 50nm. © 2014 SPIE.
英文摘要: Nanofabrication is the foundation of nanophotonics and has become a research hotspot in the last decades. The method annealing crack is proposed to transfer the nanocracks from ultraviolet (UV) resist to other photonic materials. The method is demonstrated by simulating the inner stress distribution with the thermal-structure analysis. In addition, the parameter influence to the maximum stress is discussed and the results indicate that the annealing temperature has a large effect. The method is simple, low cost, high efficiency and is a good candidate to fabricate nanophotonic structures with critical size less than 50nm. © 2014 SPIE.
收录类别: Ei
语种: 英语
卷号: 9272
ISSN号: 0277786X
文章类型: 会议论文
页码: 92720K
Citation statistics:
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7669
Appears in Collections:微电子装备总体研究室(四室)_会议论文

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作者单位: 1. Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing, China
2. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China

Recommended Citation:
Xia, Liangping,Zhang, Man,Yang, Zheng,et al. Nanofabrication with sub-50nm features by imprinting-induced cracks[C]. 见:Proceedings of SPIE: Optical Design and Testing VI. 2014.
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