IOE OpenIR  > 微电子装备总体研究室(四室)
Fabrication of nano-pillar with sub-100nm resolution based on thiol-ene
Zhang, Man; Deng, Qiling; Shi, Lifang; Pang, Hui; Cao, Axiu; Hu, Song; Deng, QL (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China.
Volume9277
Pages92771U
2014
Language英语
ISSN0277-786X
DOI10.1117/12.2073892
Subtype会议论文
AbstractThis paper demonstrates an approach to fabricate nano-pillar based on thiol-ene via soft-lithography. The template is anodic aluminum oxygen (AAO) with ordered nano-holes with the diameter of 90nm. The nano-pillar consists of rigid thiol-ene features on an elastic poly(dimethylsiloxane) (PDMS) support. It is capable of patterning both flat and curved substrate. The thiol-ene is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. Here, we fabricated a two-layer structure, which included rigid thiol-ene nano-pillar with sub-100nm resolution and soft PDMS substrate. The experiment results show that this approach can be used to fabricate high-resolution features and the thiol-ene is an excellent imprint material. The fabrication technique in this paper is simple, low-cost, high-resolution and easy to high throughput, which has broad application prospects in the preparation of nanostructures.; This paper demonstrates an approach to fabricate nano-pillar based on thiol-ene via soft-lithography. The template is anodic aluminum oxygen (AAO) with ordered nano-holes with the diameter of 90nm. The nano-pillar consists of rigid thiol-ene features on an elastic poly(dimethylsiloxane) (PDMS) support. It is capable of patterning both flat and curved substrate. The thiol-ene is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. Here, we fabricated a two-layer structure, which included rigid thiol-ene nano-pillar with sub-100nm resolution and soft PDMS substrate. The experiment results show that this approach can be used to fabricate high-resolution features and the thiol-ene is an excellent imprint material. The fabrication technique in this paper is simple, low-cost, high-resolution and easy to high throughput, which has broad application prospects in the preparation of nanostructures.
Conference NameProceedings of SPIE: NANOPHOTONICS AND MICRO/NANO OPTICS II
Conference Date2014
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7664
Collection微电子装备总体研究室(四室)
Corresponding AuthorDeng, QL (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China.
Affiliation1.[Zhang, Man
2.Deng, Qiling
3.Shi, Lifang
4.Pang, Hui
5.Cao, Axiu
6.Hu, Song] Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Zhang, Man,Deng, Qiling,Shi, Lifang,et al. Fabrication of nano-pillar with sub-100nm resolution based on thiol-ene[C],2014:92771U.
Files in This Item:
File Name/Size DocType Version Access License
2014-2167.pdf(451KB)会议论文 开放获取CC BY-NC-SAApplication Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Zhang, Man]'s Articles
[Deng, Qiling]'s Articles
[Shi, Lifang]'s Articles
Baidu academic
Similar articles in Baidu academic
[Zhang, Man]'s Articles
[Deng, Qiling]'s Articles
[Shi, Lifang]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Zhang, Man]'s Articles
[Deng, Qiling]'s Articles
[Shi, Lifang]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.