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题名:
Fabrication of nano-pillar with sub-100nm resolution based on thiol-ene
作者: Zhang, Man; Deng, Qiling; Shi, Lifang; Pang, Hui; Cao, Axiu; Hu, Song
出版日期: 2014
会议名称: Proceedings of SPIE: NANOPHOTONICS AND MICRO/NANO OPTICS II
会议日期: 2014
学科分类: nano-pillar; thiol-ene; soft-lithography; PDMS
DOI: 10.1117/12.2073892
通讯作者: Deng, QL (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China.
中文摘要: This paper demonstrates an approach to fabricate nano-pillar based on thiol-ene via soft-lithography. The template is anodic aluminum oxygen (AAO) with ordered nano-holes with the diameter of 90nm. The nano-pillar consists of rigid thiol-ene features on an elastic poly(dimethylsiloxane) (PDMS) support. It is capable of patterning both flat and curved substrate. The thiol-ene is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. Here, we fabricated a two-layer structure, which included rigid thiol-ene nano-pillar with sub-100nm resolution and soft PDMS substrate. The experiment results show that this approach can be used to fabricate high-resolution features and the thiol-ene is an excellent imprint material. The fabrication technique in this paper is simple, low-cost, high-resolution and easy to high throughput, which has broad application prospects in the preparation of nanostructures.
英文摘要: This paper demonstrates an approach to fabricate nano-pillar based on thiol-ene via soft-lithography. The template is anodic aluminum oxygen (AAO) with ordered nano-holes with the diameter of 90nm. The nano-pillar consists of rigid thiol-ene features on an elastic poly(dimethylsiloxane) (PDMS) support. It is capable of patterning both flat and curved substrate. The thiol-ene is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. Here, we fabricated a two-layer structure, which included rigid thiol-ene nano-pillar with sub-100nm resolution and soft PDMS substrate. The experiment results show that this approach can be used to fabricate high-resolution features and the thiol-ene is an excellent imprint material. The fabrication technique in this paper is simple, low-cost, high-resolution and easy to high throughput, which has broad application prospects in the preparation of nanostructures.
语种: 英语
卷号: 9277
ISSN号: 0277-786X
文章类型: 会议论文
页码: 92771U
Citation statistics:
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7664
Appears in Collections:微电子装备总体研究室(四室)_会议论文

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作者单位: 1.[Zhang, Man
2.Deng, Qiling
3.Shi, Lifang
4.Pang, Hui
5.Cao, Axiu
6.Hu, Song] Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China

Recommended Citation:
Zhang, Man,Deng, Qiling,Shi, Lifang,et al. Fabrication of nano-pillar with sub-100nm resolution based on thiol-ene[C]. 见:Proceedings of SPIE: NANOPHOTONICS AND MICRO/NANO OPTICS II. 2014.
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