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Design of a projection objective with high numeric aperture and large view field
Liu, Junbo; Hu, Song; Gao, Hongtao; Zhao, Lixin; Zhu, Xianchang; Liu, JB (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China.
Volume9283
Pages92830L
2014
Language英语
ISSN0277-786X
DOI10.1117/12.2069472
Subtype会议论文
AbstractAs the primary facility for the manufacturing of integrated circuit(IC), and MEMS devices([1]), the lithographic equipment's improvement is restricted by the projection objective which can decide the capacity of the image transmission of the facility and make the facility be capable of reaching the higher precision or beyond. On the basis of the function, increasing the numeric aperture is coupled with the raising of resolution of the projection objective. In this paper, a design of a projection objective with high numeric aperture and large view field for I-line lithography is proposed. Owning a dual-telecentric structure this optical system owns an angular magnification of -1.25, an effective image field of 90x90mm and an image numeric aperture of 0.2. Two aspheric surfaces are adopted in this projection objective to enhance the quality of imaging that will insure the field curvature lower than a half of the DOF, restrict the distortion lower than +/-sigma/5 and make the MTF approximate the diffraction limits.; As the primary facility for the manufacturing of integrated circuit(IC), and MEMS devices([1]), the lithographic equipment's improvement is restricted by the projection objective which can decide the capacity of the image transmission of the facility and make the facility be capable of reaching the higher precision or beyond. On the basis of the function, increasing the numeric aperture is coupled with the raising of resolution of the projection objective. In this paper, a design of a projection objective with high numeric aperture and large view field for I-line lithography is proposed. Owning a dual-telecentric structure this optical system owns an angular magnification of -1.25, an effective image field of 90x90mm and an image numeric aperture of 0.2. Two aspheric surfaces are adopted in this projection objective to enhance the quality of imaging that will insure the field curvature lower than a half of the DOF, restrict the distortion lower than +/-sigma/5 and make the MTF approximate the diffraction limits.
Conference NameProceedings of SPIE: 7TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: DESIGN, MANUFACTURING, AND TESTING OF MICRO- AND NANO-OPTICAL DEVICES AND SYSTEMS
Conference Date2014
Citation statistics
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7662
Collection微电子装备总体研究室(四室)
Corresponding AuthorLiu, JB (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China.
Affiliation1.[Liu, Junbo
2.Hu, Song
3.Gao, Hongtao
4.Zhao, Lixin
5.Zhu, Xianchang] Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China
Recommended Citation
GB/T 7714
Liu, Junbo,Hu, Song,Gao, Hongtao,et al. Design of a projection objective with high numeric aperture and large view field[C],2014:92830L.
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