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题名:
Design of a projection objective with high numeric aperture and large view field
作者: Liu, Junbo; Hu, Song; Gao, Hongtao; Zhao, Lixin; Zhu, Xianchang
出版日期: 2014
会议名称: Proceedings of SPIE: 7TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: DESIGN, MANUFACTURING, AND TESTING OF MICRO- AND NANO-OPTICAL DEVICES AND SYSTEMS
会议日期: 2014
学科分类: High numeric aperture; large view field; aspheric surface; dual-telecentric structure
DOI: 10.1117/12.2069472
通讯作者: Liu, JB (reprint author), Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China.
中文摘要: As the primary facility for the manufacturing of integrated circuit(IC), and MEMS devices([1]), the lithographic equipment's improvement is restricted by the projection objective which can decide the capacity of the image transmission of the facility and make the facility be capable of reaching the higher precision or beyond. On the basis of the function, increasing the numeric aperture is coupled with the raising of resolution of the projection objective. In this paper, a design of a projection objective with high numeric aperture and large view field for I-line lithography is proposed. Owning a dual-telecentric structure this optical system owns an angular magnification of -1.25, an effective image field of 90x90mm and an image numeric aperture of 0.2. Two aspheric surfaces are adopted in this projection objective to enhance the quality of imaging that will insure the field curvature lower than a half of the DOF, restrict the distortion lower than +/-sigma/5 and make the MTF approximate the diffraction limits.
英文摘要: As the primary facility for the manufacturing of integrated circuit(IC), and MEMS devices([1]), the lithographic equipment's improvement is restricted by the projection objective which can decide the capacity of the image transmission of the facility and make the facility be capable of reaching the higher precision or beyond. On the basis of the function, increasing the numeric aperture is coupled with the raising of resolution of the projection objective. In this paper, a design of a projection objective with high numeric aperture and large view field for I-line lithography is proposed. Owning a dual-telecentric structure this optical system owns an angular magnification of -1.25, an effective image field of 90x90mm and an image numeric aperture of 0.2. Two aspheric surfaces are adopted in this projection objective to enhance the quality of imaging that will insure the field curvature lower than a half of the DOF, restrict the distortion lower than +/-sigma/5 and make the MTF approximate the diffraction limits.
语种: 英语
卷号: 9283
ISSN号: 0277-786X
文章类型: 会议论文
页码: 92830L
Citation statistics:
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7662
Appears in Collections:微电子装备总体研究室(四室)_会议论文

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作者单位: 1.[Liu, Junbo
2.Hu, Song
3.Gao, Hongtao
4.Zhao, Lixin
5.Zhu, Xianchang] Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China

Recommended Citation:
Liu, Junbo,Hu, Song,Gao, Hongtao,et al. Design of a projection objective with high numeric aperture and large view field[C]. 见:Proceedings of SPIE: 7TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: DESIGN, MANUFACTURING, AND TESTING OF MICRO- AND NANO-OPTICAL DEVICES AND SYSTEMS. 2014.
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