| The next generation microelectronics craft technique: Nanoimprint lithography | |
| Wei, Jiang1; Nan, Wang1; Wei, Yan2; Song, Hu1; Xiao-Qiong, Pu1 | |
| Pages | 337-342 |
| 2013 | |
| Language | 英语 |
| DOI | 10.1109/3M-NANO.2013.6737445 |
| Indexed By | Ei |
| Subtype | 会议论文 |
| Abstract | Transfer of graphics is achieved by optical lithography for several decades in semiconductor process. The production capacity of 45 nm node has been formed. But now semiconductor industry is difficult to be developed according to the Moore law because of the inherent limitations of optical lithography. Now electron-beam directwriting, X-ray exposure and nanoimprint technology are the main technologies for next generation graphics transfer technology. Nanoimprint technology has the advantages of high yield, lowcost and simple process. This paper introduced the traditional nanoimprint technology and its developmen, including the principle, applications and challenges. © 2013 IEEE.; Transfer of graphics is achieved by optical lithography for several decades in semiconductor process. The production capacity of 45 nm node has been formed. But now semiconductor industry is difficult to be developed according to the Moore law because of the inherent limitations of optical lithography. Now electron-beam directwriting, X-ray exposure and nanoimprint technology are the main technologies for next generation graphics transfer technology. Nanoimprint technology has the advantages of high yield, lowcost and simple process. This paper introduced the traditional nanoimprint technology and its developmen, including the principle, applications and challenges. © 2013 IEEE. |
| Conference Name | 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings |
| Conference Date | 2013 |
| Citation statistics | |
| Document Type | 会议论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7658 |
| Collection | 微电子装备总体研究室（四室） |
| Affiliation | 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, 610209, China 2. Dept. of Industrial Design Engineering, Sichuan University, Chengdu, 610065, China |
| Recommended Citation GB/T 7714 | Wei, Jiang,Nan, Wang,Wei, Yan,et al. The next generation microelectronics craft technique: Nanoimprint lithography[C],2013:337-342. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2013-2066.pdf（1229KB） | 会议论文 | 开放获取 | CC BY-NC-SA | Application Full Text | ||
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