| 题名: | The next generation microelectronics craft technique: Nanoimprint lithography |
| 作者: | Wei, Jiang1; Nan, Wang1; Wei, Yan2; Song, Hu1; Xiao-Qiong, Pu1
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| 出版日期: | 2013
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| 会议名称: | 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings
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| 会议日期: | 2013
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| 学科分类: | Manufacture - Microelectronics - Nanotechnology - Photolithography - Semiconductor device manufacture - Technology
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| DOI: | 10.1109/3M-NANO.2013.6737445
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| 中文摘要: | Transfer of graphics is achieved by optical lithography for several decades in semiconductor process. The production capacity of 45 nm node has been formed. But now semiconductor industry is difficult to be developed according to the Moore law because of the inherent limitations of optical lithography. Now electron-beam directwriting, X-ray exposure and nanoimprint technology are the main technologies for next generation graphics transfer technology. Nanoimprint technology has the advantages of high yield, lowcost and simple process. This paper introduced the traditional nanoimprint technology and its developmen, including the principle, applications and challenges. © 2013 IEEE. |
| 英文摘要: | Transfer of graphics is achieved by optical lithography for several decades in semiconductor process. The production capacity of 45 nm node has been formed. But now semiconductor industry is difficult to be developed according to the Moore law because of the inherent limitations of optical lithography. Now electron-beam directwriting, X-ray exposure and nanoimprint technology are the main technologies for next generation graphics transfer technology. Nanoimprint technology has the advantages of high yield, lowcost and simple process. This paper introduced the traditional nanoimprint technology and its developmen, including the principle, applications and challenges. © 2013 IEEE. |
| 收录类别: | Ei
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| 语种: | 英语
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| 文章类型: | 会议论文
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| 页码: | 337-342
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| 内容类型: | 会议论文
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| URI标识: | http://ir.ioe.ac.cn/handle/181551/7658
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| Appears in Collections: | 微电子装备总体研究室（四室）_会议论文
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作者单位: | 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, 610209, China
2. Dept. of Industrial Design Engineering, Sichuan University, Chengdu, 610065, China
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| Recommended Citation: | |
Wei, Jiang,Nan, Wang,Wei, Yan,et al. The next generation microelectronics craft technique: Nanoimprint lithography[C]. 见:2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings. 2013.
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