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题名:
Immersed nanospheres super-lithography for the fabrication of sub-70nm nanoholes with period below 700nm
作者: Li, Shuhong1; Shi, Lifang2; Yang, Zheng1; Huang, Xia1; Zhang, Zhiyou1; Gao, Fuhua1; Guo, Yongkang1; Yu, Weixing3; Du, Jinglei1
出版日期: 2012
会议名称: 2012 12th IEEE International Conference on Nanotechnology, NANO 2012
会议日期: 2012
DOI: 10.1109/NANO.2012.6322119
通讯作者: Li, S. (lsh2772@yahoo.com.cn)
中文摘要: A maskless nano-lithography method by using polystyrene spheres (PSs) self-assembled on silver slab (NSSL) was proposed in [optics express, Vol. 16, No. 19 (2008) 14397]. Following that, to break the limitations in resolution and PSs period of NSSL method, in this paper, we present PSs immersed super-resolution lithography (NSISL) technology by embedding the PSs into appropriate material to improve the efficiency of the surface plasmon excitation. The energy modulating mechanism and the rules of the resolution affected by silver slab were studied by calculating and analysing the energy distribution. The curve of the lithography resolution versus the silver thickness was presented. In order to verify this method, contrast analysis was carried out with NSSL. The results show that the lithography resolution is improved efficiently. Taking a specific configuration with PS diameter of 600nm as an example, the resolution was improved to 54nm from 190nm with Ag thickness of 25nm. Based on the calculation results, we carried out the experiments. Nano holes with dimension of 75nm and period of 600nm were obtained. © 2012 IEEE.
英文摘要: A maskless nano-lithography method by using polystyrene spheres (PSs) self-assembled on silver slab (NSSL) was proposed in [optics express, Vol. 16, No. 19 (2008) 14397]. Following that, to break the limitations in resolution and PSs period of NSSL method, in this paper, we present PSs immersed super-resolution lithography (NSISL) technology by embedding the PSs into appropriate material to improve the efficiency of the surface plasmon excitation. The energy modulating mechanism and the rules of the resolution affected by silver slab were studied by calculating and analysing the energy distribution. The curve of the lithography resolution versus the silver thickness was presented. In order to verify this method, contrast analysis was carried out with NSSL. The results show that the lithography resolution is improved efficiently. Taking a specific configuration with PS diameter of 600nm as an example, the resolution was improved to 54nm from 190nm with Ag thickness of 25nm. Based on the calculation results, we carried out the experiments. Nano holes with dimension of 75nm and period of 600nm were obtained. © 2012 IEEE.
收录类别: Ei
语种: 英语
ISSN号: 19449399
文章类型: 会议论文
页码: 6322119
Citation statistics:
内容类型: 会议论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7652
Appears in Collections:微电子装备总体研究室(四室)_会议论文

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作者单位: 1. School of Physics, Sichuan University, Chengdu 610064, China
2. Institute of Optics and Electronics, CAS, P.O. Box 350, Chengdu 610209, China
3. Changchun Institute of Optics, Fine Mechanics and Physics, CAS, Changchun 130033, China

Recommended Citation:
Li, Shuhong,Shi, Lifang,Yang, Zheng,et al. Immersed nanospheres super-lithography for the fabrication of sub-70nm nanoholes with period below 700nm[C]. 见:2012 12th IEEE International Conference on Nanotechnology, NANO 2012. 2012.
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