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Immersed nanospheres super-lithography for the fabrication of sub-70nm nanoholes with period below 700nm
Li, Shuhong1; Shi, Lifang2; Yang, Zheng1; Huang, Xia1; Zhang, Zhiyou1; Gao, Fuhua1; Guo, Yongkang1; Yu, Weixing3; Du, Jinglei1; Li, S. (lsh2772@yahoo.com.cn)
Pages6322119
2012
Language英语
ISSN19449399
DOI10.1109/NANO.2012.6322119
Indexed ByEi
Subtype会议论文
AbstractA maskless nano-lithography method by using polystyrene spheres (PSs) self-assembled on silver slab (NSSL) was proposed in [optics express, Vol. 16, No. 19 (2008) 14397]. Following that, to break the limitations in resolution and PSs period of NSSL method, in this paper, we present PSs immersed super-resolution lithography (NSISL) technology by embedding the PSs into appropriate material to improve the efficiency of the surface plasmon excitation. The energy modulating mechanism and the rules of the resolution affected by silver slab were studied by calculating and analysing the energy distribution. The curve of the lithography resolution versus the silver thickness was presented. In order to verify this method, contrast analysis was carried out with NSSL. The results show that the lithography resolution is improved efficiently. Taking a specific configuration with PS diameter of 600nm as an example, the resolution was improved to 54nm from 190nm with Ag thickness of 25nm. Based on the calculation results, we carried out the experiments. Nano holes with dimension of 75nm and period of 600nm were obtained. © 2012 IEEE.; A maskless nano-lithography method by using polystyrene spheres (PSs) self-assembled on silver slab (NSSL) was proposed in [optics express, Vol. 16, No. 19 (2008) 14397]. Following that, to break the limitations in resolution and PSs period of NSSL method, in this paper, we present PSs immersed super-resolution lithography (NSISL) technology by embedding the PSs into appropriate material to improve the efficiency of the surface plasmon excitation. The energy modulating mechanism and the rules of the resolution affected by silver slab were studied by calculating and analysing the energy distribution. The curve of the lithography resolution versus the silver thickness was presented. In order to verify this method, contrast analysis was carried out with NSSL. The results show that the lithography resolution is improved efficiently. Taking a specific configuration with PS diameter of 600nm as an example, the resolution was improved to 54nm from 190nm with Ag thickness of 25nm. Based on the calculation results, we carried out the experiments. Nano holes with dimension of 75nm and period of 600nm were obtained. © 2012 IEEE.
Conference Name2012 12th IEEE International Conference on Nanotechnology, NANO 2012
Conference Date2012
Citation statistics
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7652
Collection微电子装备总体研究室(四室)
Corresponding AuthorLi, S. (lsh2772@yahoo.com.cn)
Affiliation1. School of Physics, Sichuan University, Chengdu 610064, China
2. Institute of Optics and Electronics, CAS, P.O. Box 350, Chengdu 610209, China
3. Changchun Institute of Optics, Fine Mechanics and Physics, CAS, Changchun 130033, China
Recommended Citation
GB/T 7714
Li, Shuhong,Shi, Lifang,Yang, Zheng,et al. Immersed nanospheres super-lithography for the fabrication of sub-70nm nanoholes with period below 700nm[C],2012:6322119.
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