| Effects of grating marks parameters on lithography alignment precision | |
| Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Zhu, J. (zsyioe@163.com) | |
| Volume | 8564 |
| Pages | 85641K |
| 2012 | |
| Language | 英语 |
| ISSN | 0277786X |
| DOI | 10.1117/12.999503 |
| Indexed By | Ei |
| Subtype | 会议论文 |
| Abstract | Effects of grating marks parameters on alignment precision and scope are investigated in this paper. In the lithography alignment method based on moire´ fringe, gratings are especially used as alignment marks. However, the rational design of grating marks for this approach to realize high-precision alignment is of great importance. In order to improve the feasibility of the alignment method, effects of several physical parameters of grating marks on alignment precision are analyzed by numerical calculation. The results imply that qualities of grating marks, such as size of period and ratio between two gratings, have an important impact on alignment precision and scope. © 2012 SPIE.; Effects of grating marks parameters on alignment precision and scope are investigated in this paper. In the lithography alignment method based on moire´ fringe, gratings are especially used as alignment marks. However, the rational design of grating marks for this approach to realize high-precision alignment is of great importance. In order to improve the feasibility of the alignment method, effects of several physical parameters of grating marks on alignment precision are analyzed by numerical calculation. The results imply that qualities of grating marks, such as size of period and ratio between two gratings, have an important impact on alignment precision and scope. © 2012 SPIE. |
| Conference Name | Proceedings of SPIE: Nanophotonics and Micro/Nano Optics |
| Conference Date | 2012 |
| Citation statistics | |
| Document Type | 会议论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7648 |
| Collection | 微电子装备总体研究室（四室） |
| Corresponding Author | Zhu, J. (zsyioe@163.com) |
| Affiliation | 1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan, 610209, China 2. University of Electronic Science and Technology of China, Chengdu, Sichuan, 610054, China 3. Graduate University, Chinese Academy of Sciences, Beijing 100039, China |
| Recommended Citation GB/T 7714 | Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Effects of grating marks parameters on lithography alignment precision[C],2012:85641K. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2012-2163.pdf（406KB） | 会议论文 | 开放获取 | CC BY-NC-SA | Application Full Text | ||
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