| 题名: | Effects of grating marks parameters on lithography alignment precision |
| 作者: | Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2
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| 出版日期: | 2012
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| 会议名称: | Proceedings of SPIE: Nanophotonics and Micro/Nano Optics
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| 会议日期: | 2012
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| DOI: | 10.1117/12.999503
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| 通讯作者: | Zhu, J. (zsyioe@163.com)
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| 中文摘要: | Effects of grating marks parameters on alignment precision and scope are investigated in this paper. In the lithography alignment method based on moire´ fringe, gratings are especially used as alignment marks. However, the rational design of grating marks for this approach to realize high-precision alignment is of great importance. In order to improve the feasibility of the alignment method, effects of several physical parameters of grating marks on alignment precision are analyzed by numerical calculation. The results imply that qualities of grating marks, such as size of period and ratio between two gratings, have an important impact on alignment precision and scope. © 2012 SPIE. |
| 英文摘要: | Effects of grating marks parameters on alignment precision and scope are investigated in this paper. In the lithography alignment method based on moire´ fringe, gratings are especially used as alignment marks. However, the rational design of grating marks for this approach to realize high-precision alignment is of great importance. In order to improve the feasibility of the alignment method, effects of several physical parameters of grating marks on alignment precision are analyzed by numerical calculation. The results imply that qualities of grating marks, such as size of period and ratio between two gratings, have an important impact on alignment precision and scope. © 2012 SPIE. |
| 收录类别: | Ei
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| 语种: | 英语
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| 卷号: | 8564
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| ISSN号: | 0277786X
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| 文章类型: | 会议论文
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| 页码: | 85641K
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| Citation statistics: |
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| 内容类型: | 会议论文
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| URI标识: | http://ir.ioe.ac.cn/handle/181551/7648
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| Appears in Collections: | 微电子装备总体研究室（四室）_会议论文
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| 2012-2163.pdf（406KB） | 会议论文 | -- | 限制开放 | | View
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作者单位: | 1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan, 610209, China
2. University of Electronic Science and Technology of China, Chengdu, Sichuan, 610054, China
3. Graduate University, Chinese Academy of Sciences, Beijing 100039, China
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| Recommended Citation: | |
Zhu, Jiangping,Hu, Song,Yu, Junsheng. Effects of grating marks parameters on lithography alignment precision[C]. 见:Proceedings of SPIE: Nanophotonics and Micro/Nano Optics. 2012.
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