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Effects of grating marks parameters on lithography alignment precision
Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Zhu, J. (zsyioe@163.com)
Volume8564
Pages85641K
2012
Language英语
ISSN0277786X
DOI10.1117/12.999503
Indexed ByEi
Subtype会议论文
AbstractEffects of grating marks parameters on alignment precision and scope are investigated in this paper. In the lithography alignment method based on moire´ fringe, gratings are especially used as alignment marks. However, the rational design of grating marks for this approach to realize high-precision alignment is of great importance. In order to improve the feasibility of the alignment method, effects of several physical parameters of grating marks on alignment precision are analyzed by numerical calculation. The results imply that qualities of grating marks, such as size of period and ratio between two gratings, have an important impact on alignment precision and scope. © 2012 SPIE.; Effects of grating marks parameters on alignment precision and scope are investigated in this paper. In the lithography alignment method based on moire´ fringe, gratings are especially used as alignment marks. However, the rational design of grating marks for this approach to realize high-precision alignment is of great importance. In order to improve the feasibility of the alignment method, effects of several physical parameters of grating marks on alignment precision are analyzed by numerical calculation. The results imply that qualities of grating marks, such as size of period and ratio between two gratings, have an important impact on alignment precision and scope. © 2012 SPIE.
Conference NameProceedings of SPIE: Nanophotonics and Micro/Nano Optics
Conference Date2012
Citation statistics
Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type会议论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7648
Collection微电子装备总体研究室(四室)
Corresponding AuthorZhu, J. (zsyioe@163.com)
Affiliation1. Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan, 610209, China
2. University of Electronic Science and Technology of China, Chengdu, Sichuan, 610054, China
3. Graduate University, Chinese Academy of Sciences, Beijing 100039, China
Recommended Citation
GB/T 7714
Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Effects of grating marks parameters on lithography alignment precision[C],2012:85641K.
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