| Antireflective structures fabricated from silica nanoparticles with regular arrangement | |
| Zhang, Yukun1,2,3; Liu, Yan1; Pang, Hui1; Shi, Lifang1; Dong, Xiaochun1; Deng, Qiling1; Du, Jinglei2; Yin, Shaoyun3; Du, Chunlei3; Zhang, Y. | |
| Volume | 8564 |
| Pages | 85641I |
| 2012 | |
| Language | 英语 |
| ISSN | 0277786X |
| DOI | 10.1117/12.999475 |
| Indexed By | Ei |
| Subtype | 会议论文 |
| Abstract | Novel antireflective surfaces with silica particles arranged regularly and tightly are proposed and fabricated by self assemble silica nanoparticle through electrostatic attraction between charged colloidal particles and charged polyelectrolyte multilayer. Due to regularly arrangement of the particles, the nanoparticle coatings, as homogeneous porous layers with uniform distribution, show high-quality and uniform antireflective capability in each region on the substrate. It has been sufficiently demonstrated in our experiments. Furthermore, the relations among the antireflective capability, average size of nanoparticles, and incident angle of the irradiated light are calculated by finite-difference time-domain method. It is demonstrated that the nanostructure coatings with particles of 100 nm size possess the excellently suitable performance for reflection/transmission with respect to visible-light region. From the results, the fabricated anti-reflective nanostructures have great potential to improve the efficiency of optoelectronic devices such as a photo-detector and solar cells. © 2012 SPIE.; Novel antireflective surfaces with silica particles arranged regularly and tightly are proposed and fabricated by self assemble silica nanoparticle through electrostatic attraction between charged colloidal particles and charged polyelectrolyte multilayer. Due to regularly arrangement of the particles, the nanoparticle coatings, as homogeneous porous layers with uniform distribution, show high-quality and uniform antireflective capability in each region on the substrate. It has been sufficiently demonstrated in our experiments. Furthermore, the relations among the antireflective capability, average size of nanoparticles, and incident angle of the irradiated light are calculated by finite-difference time-domain method. It is demonstrated that the nanostructure coatings with particles of 100 nm size possess the excellently suitable performance for reflection/transmission with respect to visible-light region. From the results, the fabricated anti-reflective nanostructures have great potential to improve the efficiency of optoelectronic devices such as a photo-detector and solar cells. © 2012 SPIE. |
| Conference Name | Proceedings of SPIE: Nanophotonics and Micro/Nano Optics |
| Conference Date | 2012 |
| Citation statistics | |
| Document Type | 会议论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7647 |
| Collection | 微电子装备总体研究室（四室） |
| Corresponding Author | Zhang, Y. |
| Affiliation | 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 2. Microelectronics Department, Sichuan University, Chengdu 610064, China 3. Chongqing Institute of Green, Intelligent of Chinese Academy of Sciences, Chongqing 401122, China |
| Recommended Citation GB/T 7714 | Zhang, Yukun,Liu, Yan,Pang, Hui,et al. Antireflective structures fabricated from silica nanoparticles with regular arrangement[C],2012:85641I. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2012-2162.pdf（698KB） | 会议论文 | 开放获取 | CC BY-NC-SA | Application Full Text | ||
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